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Aluminium Titanium

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Category	Alloy Sputtering Target
Chemical Formula	AlTi
Composition	Aluminium Titanium
Kuchena	99.9%, 99.95%, 99.99%
Shape	Ndiro, Column Targets, arc cathodes, Tsika-yakagadzirwa
Production Process	Vacuum Melting, PM
Saizi Inowanikwa	L≤2000mm,W≤200mm

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Izvo zvinodikanwa zvemhando yakanangwa ye sputter coating yakakwirira kupfuura iyo yechinyakare zvinhu indasitiri. Iyo yunifomu microstructure yechinangwa inokanganisa zvakananga kuita kwe sputtering. Isu tine yakapedzwa yemhando yekutarisira sisitimu uye isu tinosarudza yakakwirira kuchena zvigadzirwa uye kunyatso sanganisa kuti ive nechokwadi chehomogeneity. Aluminium Titanium alloy sputtering target inogadzirwa nenzira yevacuum inopisa yekutsikirira nzira.

Yedu Aluminium Titanium sputtering targets inogona kupa yakasarudzika oxidation-inodzivirira nitride coating, Titanium aluminium nitride (TiAlN). TiAlN ndiyo yazvino yakakurumbira sefirimu rekucheka maturusi, inotsvedza zvikamu uye tribo-machira. Iyo ine yakanyanya kuoma, kuomarara, kupfeka kusagadzikana kuita uye oxidation tembiricha.

Yedu yakajairika AlTi tarisiro uye zvivakwa zvavo

	Ti-75Al at%	Ti-70Al at%	Ti-67Al at%	Ti-60Al at%	Ti-50Al at%	Ti-30Al at%	Ti-20Al at%	Ti-14Al at%
Kuchena (%)	99.7	99.7	99.7	99.7	99.8/99.9	99.9	99.9	99.9
Density(g/cm³）	3.1	3.2	3.3	3.4	3.63/3.85	3.97	4.25	4.3
Gmvura Size(µm)	100	100	100	100	100/-	-	-	-
Process	HIP	HIP	HIP	HIP	HIP/VAR	VAR	VAR	VAR

Rich Special Equipment inyanzvi muKugadzira KweSputtering Target uye inogona kugadzira Aluminium Titanium Sputtering Materials zvinoenderana neVatengi 'zvakatemwa. Taigona kupa akasiyana emhando dzejometri: machubhu, arc cathodes, planar kana tsika-yakagadzirwa, uye yakakura chikamu huwandu hweAluminium. Zvigadzirwa zvedu zvinoratidzira zvakanakisa zvemuchina zvivakwa, homogeneous microstructure, yakakwenenzverwa nzvimbo isina kupatsanurwa, pores kana kutsemuka. Kuti uwane mamwe mashoko, tapota taura nesu.

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