Wholesale AlTa Sputtering Target High Purity Thin Film PVD Coating Custom Made Manufacturer and Supplier

Aluminium-Tantalum

AlTa Sputtering Target High Purity Thin Film PVD Coating Custom Made Featured Image

Tsanangudzo Pfupi

Category	Alloy Sputtering Target
Chemical Formula	AlTa
Composition	Aluminium-Tantalum
Kuchena	99.9%, 99.95%, 99.99%
Shape	Ndiro, Column Targets, arc cathodes, Tsika-yakagadzirwa
Production Process	Vacuum Melting, PM
Saizi Inowanikwa	L≤200mm,W≤200mm

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Zvinangwa zvinogadzirwa nekusanganisa Aluminium neTantalum poda kana vacuum kunyungudika kunoteverwa nekukochekera kusvika kuzere density. Izvo zvakabatanidzwa zvinhu zvinosarudzwa kunyungudutswa uye zvino zvinogadzirwa kuita inodiwa chimiro chechinangwa.

Aluminium Tantalum sputtering target ine yakanyanya kuchena, homogeneous microstructure uye yakanakisa conductivity. Inoshandiswa zvakanyanya mukugadzira mafirimu matete eiyo flat panel kuratidza indasitiri. Aluminium Tantalum inogonawo kuwedzerwa kuti ibudise kushanda kwepamusoro Titanium alloy kuti ivandudze kukwana kwayo kwepamusoro-tembiricha.

Kusachena kwemukati kweAl-Ta alloy

composition	Content(%）
	Ta	Fe	Si	C	O
AlTa60	55.0~65.0	≤0.05	≤0.02	≤0.01	≤0.05
AlTa70	65.0~75.0	≤0.05	≤0.02	≤0.01	≤0.05

Rich Special Equipment inoshanda muKugadzira KweSputtering Target uye inogona kugadzira Aluminium Tantalum Sputtering Materials zvinoenderana neVatengi'madidziro. Zvigadzirwa zvedu zvinoratidzira zvakanakisa zvemuchina zvivakwa, homogeneous chimiro, yakakwenenzverwa nzvimbo isina kupatsanurwa, pores kana makatsemuka. Kuti uwane mamwe mashoko, tapota taura nesu.

Zvakapfuura: AlTi alloy Sputtering Target High Purity

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