AlSi Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made

Zvinangwa zvinogadzirwa nekusanganisa Aluminium neSilicon poda inoteverwa nekukochekera kusvika kuzere density. Izvo zvakabatanidzwa zvinhu zvinosarudzwa kunyungudutswa uye zvino zvinogadzirwa kuita inodiwa chimiro chechinangwa. Yedu Aluminium Silicon sputtering targets inowanikwa mune rectangular, denderedzwa kana tsika-yakagadzirwa mafomu ejometri, zvinyorwa zveAluminium kubva pa10-90% atomic, uye inoratidzira kuchena kwepamusoro, homogeneous microstructure, high density uye hupenyu hurefu hwekushanda.

Aluminium Silicon inoshandiswa zvakanyanya mumotokari, ndege uye maindasitiri ekuvaka nekuda kwemusanganiswa wayo wakasarudzika wehunhu hunodiwa, kusanganisira huremu huremu, yakanaka yekupisa conductivity uye michina. Density yechinhu ichi i2.6 ~ 2.7g/cm3, thermal conductivity coefficient 101 ~ 126W/(m · ℃), tensile modulus 71.0GPa, kupera simba ± 45MPa. Aluminium-silicon alloys anewo yakanakisa corrosion resistance, machinability, uye weldability. Aluminium-silicon alloys anoshandiswa mumhando dzakasiyana dzemotokari, aerospace, uye zvigadzirwa zvevatengi, sezvivharo zveinjini nemacylinder liner, mapiston, mabearing alloy materials, uye zvinhu zvemagetsi zvevatengi.+2. Iyo ine yakakwira kunyungudika, ductility, kuomarara, uye corrosion resistance.