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AlCu Sputtering Target High Purity Thin Film PVD Coating Custom Made

Aluminium Copper

Tsanangudzo Pfupi

Category

Alloy Sputtering Target

Chemical Formula

AlCu

Composition

Aluminium Copper

Kuchena

99.9%, 99.95%, 99.99%

Shape

Ndiro, Column Targets, arc cathodes, Tsika-yakagadzirwa

Production Process

Vacuum Melting, PM

Saizi Inowanikwa

L≤200mm,W≤200mm


Product Detail

Product Tags

Aluminium Copper sputtering target yakanakira akati wandei maindasitiri uye maapplication, nekuda kwekuoma kwayo kwakanyanya, kusimba kwesimba uye kureruka huremu. Iyo inowanzo ine 1-3% yemhangura yemukati uye ine yakafanana kemikari zvivakwa neAluminium. AlCu ine yakakwira mechanicha zvivakwa, yakanakisa machinability, uye yakakwirira-tembiricha kukodzera, saka inogona kunge iri yakakodzera zvinhu zvekushanda kweAluminium alloy. Yakanyanya kuchena AlCu alloy sputtering target inogona kushandiswa muhupamhi hwakawanda hwemaindasitiri minda kubva semiconductor uye zvemagetsi zvinoshanda zvikamu.

Rich Special Equipment inoshanda muKugadzira KweSputtering Target uye inogona kugadzira Aluminium Chromium Sputtering Materials zvinoenderana neVatengi'madidziro. Zvigadzirwa zvedu zvinoratidzira zvakanakisa zvemuchina zvivakwa, homogeneous chimiro, yakakwenenzverwa nzvimbo isina kupatsanurwa, pores, kana makatsemuka. Kuti uwane mamwe mashoko, tapota taura nesu.


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