NiCrAlY Sputtering Target High mama manifinifi ata Pvd fa'apipi'i Fa'apitoa

NiCrAlY Sputtering target e gaosia e le Vacuum Melting o mea mata ole Nickel Chromium Aluminum Yttrium. E maualuga le tumau ma le tele o fatu ma leai ni pores. O lona tuufaatasiga o Chromium e mai le 10-30% (wt), Alumini 10-20% (wt), Yttrium 0.5-1.0% (wt), ma liliu ese le fausaga lua-layered o le γ+β.
E masani ona fa'aogaina le lapisi NiCrAlY e fai ma pa puipui vevela. Ole a'a ole vevela maualuga e faasino ile osofa'iga fa'ama'i ole Chromia-forming Iron, Nickel ma Cobalt-base Alloys mai kasa, masima malo pe liusuavai, po'o u'amea u'amea, e masani lava ile vevela i luga atu o le 400°C (750ºF). O le fa'aogaina o le NiCrAlY layer o lo'o fa'aogaina i le High Temperature Step Alloy o va'alele ma gas turbine e mafai ona fa'aleleia atili ai le fa'aogaina o mea e fa'aleaga ma fa'alautele ai le ola o oloa.