O le a le matafaioi o le sputtering target i le vacuum coating

Vacuum plating i le filifiliga o sputtering mea sini autu ua avea o se mataupu mo tagata, i le taimi nei, e pei o le sputtering coating, aemaise lava le atinae o le magnetron sputtering coating tomai, e mafai ona fai atu mo so o se faamatalaga ina ia mafai ona taulaʻi sauniuniga mea o ata manifinifi. e ala i le pomu ion, ona e ala i le sputtering mea autu i le faagasologa o le ufiufi i le ituaiga substrate, ei ai se aafiaga taua i luga o le tulaga lelei o sputtering ata tifaga, O le mea lea, o mea manaomia manaomia. e sili atu le sa'a. O iinei o le a tatou aoao ai e uiga i le matafaioi o le sputtering taulaiga i le gaogao ufiufi faatasi ma le faatonu o Beijing Relaxation

一, Filifiliga faavae ma le faavasegaina o mea autu

I le filifilia o mea faʻatatau, faʻaopoopo i le faʻaogaina o le ata lava ia e tatau ona filifilia, o faʻafitauli nei e tatau foi ona mafaufauina:

Faʻafitauli 1. E tusa ai ma le faʻaogaina ma le faʻatinoga o manaʻoga o le membrane, e manaʻomia le faʻaogaina o mea faʻapitoa e faʻamalieina manaoga faʻapitoa o le mama, faʻasalalauga faʻasalalauga, tutusa vaega, saʻo machining ma isi.

Fa'afitauli 2. O mea fa'atatau e tatau ona i ai le malosi fa'ainisinia lelei ma le mautu o vaila'au pe a uma ona fai ata;

Fa'afitauli 3. E mana'omia le fa'atupuina o ata fa'atupu fa'aputu fa'atasi ma le kasa fa'agaoioiga e pei o le ata fa'afefete;

Faʻafitauli 4. E tatau ona faʻapipiʻi le sini ma le matrix ia malosi, a le o lea, e tatau ona faʻaaogaina le mea ata tifaga ma le faʻapipiʻi lelei ma le matrix, muamua sputter se vaega o le ata pito i lalo ona saunia lea o le ata tifaga manaʻomia;

Fesili 5. I luga o le tulaga o le faʻataunuʻuina o manaʻoga o le faʻatinoga o le ata tifaga, o le laʻititi o le eseesega i le va o le faʻalauteleina o le vevela o le sini ma le matrix, o le sili atu lea, ina ia faʻaitiitia ai le aʻafiaga o le vevela vevela o le ata sputtering;

Sauniuniga o le tele o fa'aoga masani

(1) cr sini

Chromium e pei o se mea ata tifaga sputtering e le gata e faigofie ona tuʻufaʻatasia ma le mea faavae o loʻo i ai le maualuga o le pipii, ma le chromium ma le oxide CrQ3 ata tifaga, o ona mea faʻainisinia, teteʻe o le acid ma le mautu vevela e sili atu.

Beijing Ruichi High-tech Co., Ltd. e masani ona auai i: titanium target zirconium target, alumini sini, nickel target, chromium target, tungsten target, molybdenum target, copper target, silicon target, niobium target, tantalum target, titanium-silicon alloy sini, fa'amea fa'ameamea titanium-niobium, fa'amea fa'ameamea titanium-tungsten, fa'amea fa'ameamea titanium-zirconium, u'amea nickel-chromium sini, silica-aluminum u'amea fa'atatau, nickel-vanadium u'umea fa'atatau, chromium-aluminum-silicon ternary u'amea fa'ameamea，Ti al si ternary u'amea fa'aoga mea, fa'aaoga lautele i teuteuga / luga maaa ma galuega fa'apipi'i, tioata fausaga, fa'aaliga mafolafola/optical photoelectric , teuina o mata, mea faaeletonika, lomitusi ma isi galuega.