CuIn Sputtering Target High mama manifinifi ata Pvd fa'apipi'i Fa'apitoa

Copper Indium alloy sputtering target e fauina masani e ala i le liusuavai induction vacuum. E mafai e le Indium ona fa'atupuina ituaiga fa'amea 'ese'ese ole indium ma toetoe lava o elemene uma ile laulau fa'avaitaimi. Copper Indium u'amea o se u'amea binary, e masani ona fa'aaogaina e pei o le u'amea liusuavai maualalo ma u'amea u'amea.

Copper Indium alloy sputtering target e i ai le aoga iloga e mafai ona maua ai le PVD coatings ma sili atu le eletise eletise ma le faʻamamaina o saito. E mafai ona fesoasoani i le faʻavaeina o le CIGS, faʻatasi ai ma le kopa (Cu), gallium (Ga), indium (In) ma le seleni (Se) ma e faaigoa i latou vaega faʻavae. O le CIGS o loʻo i ai le maualuga o le liua o le photovoltaic, o lea e mafai ai ona faʻaoga mo le faʻaogaina o le faʻaogaina o le la.

Rich Special Materials e fa'apitoa i le Gausia o Sputtering Target ma e mafai ona gaosia Copper Indium Sputtering Materials e tusa ai ma fa'amatalaga a tagata fa'atau. Mo nisi fa'amatalaga, fa'amolemole fa'afeso'ota'i matou.