CrAl Alloy Sputtering Target High mama manifinifi ata PVD fa'apipi'i Fa'apitoa
Chromium Alumini
O le fausiaina o Chromium Aluminum Sputtering Targets e aofia ai laasaga nei:
1. Fa'afefiloi le pauta ma fa'afefiloi.
2. vevela isostatic fetaomi togafitiga e maua semi-uma oloa.
3. Fa'aogaina o le chromium alumini u'amea gaogao sputtering mea sini e maua ai le chromium alumini alumini sputtering mea sini.
I le fa'agasologa o le fa'aputuina o fa'amoemoega o le fa'aosoina o le CrAl, o lo'o fa'atūina ai se fa'alapisi Aluminium-Chrom-Nitrid (AlCrN) malosi. O lenei faʻapipiʻi e faʻaalia ai le maualuga o le maaa ma le faʻamaʻiina o mea e teteʻe ai e tusa lava pe maualuga le vevela. O tipi e mafai ona tamomoe i fafaga maualuga e faʻateleina le gaosiga ma faʻaleleia le lelei pe a faʻaogaina masini CNC.
O a matou fa'amoemoega masani a le AlCr ma latou meatotino
| Cr-70Ali% | Cr-60Ali% | Cr-50Ali% | |
| Mama (%) | 99.8/99.9/99.95 | 99.8/99.9/99.95 | 99.8/99.9/99.95 |
| Malosi(g/cm3） | 3.7 | 4.35 | 4.55 |
| Gtimuga Tele(µm) | 100/50 | 100/50 | 100/50 |
| Fa'agasologa | HIPI | HIPI | HIPI |
Rich Special Materials e fa'apitoa i le Gausia o Sputtering Target ma e mafai ona gaosia Aluminum Chromium Sputtering Materials e tusa ai ma fa'amatalaga a tagata fa'atau. O a matou oloa o loʻo faʻaalia ai mea faʻainisinia sili ona lelei, faʻapipiʻi tutusa, faʻalelei luga e aunoa ma se faʻamavaeina, pores poʻo taʻe. Mo nisi fa'amatalaga, fa'amolemole fa'afeso'ota'i matou.
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