CoFeV Alloy Sputtering Target High mama manifinifi ata Pvd fa'apipi'i Fa'apitoa

Cobalt Iron Vanadium sputtering taulaʻiga e 52% mea o loʻo i totonu o Cobalt, 9% -23% o loʻo i totonu o le Vanadium ma isi mea - ductile tumau-maneta mea. O lo'o fa'aalia ai le lelei tele o le fa'aogaina o le palasitika ma e mafai ona fau i ni vaega e lavelave fomu.

Cobalt Iron Vanadium u'amea sputtering sini e matua maualuga le saturation flux density Bs (2.4T) ma Curie vevela (980 ~ 1100 ℃). E mafai ona fesoasoani i le fa'aitiitia o le mamafa ma fa'aleleia atili le mautu i le maualuga o le vevela. O se mea talafeagai mo mea tau eletise vaalele (masini eletise faʻapitoa, electromagnet ma eletise eletise). E iai fo'i le maualuga o le saturation magnetostriction coefficient, ma e mafai ona maua ai le magnetostrictive transducer.

Rich Special Materials e fa'apitoa i le Gausia o Sputtering Target ma e mafai ona gaosia Cobalt Iron Vanadium Sputtering Materials e tusa ai ma fa'amatalaga a tagata fa'atau. Mo nisi fa'amatalaga, fa'amolemole fa'afeso'ota'i matou.