AlTa Sputtering Fa'ataula'i Si'itia maualuga mama manifinifi ata PVD fa'apipi'i Fa'apitoa Faia Faumea ma Fa'atau

Alumini-Tantalum

AlTa Sputtering Target High mama manifinifi PVD faʻapipiʻi Faʻapitoa Faia Ata Faʻaalia

Fa'amatalaga Puupuu:

Vaega	Alloy Sputtering Target
Fua Fa'atatau Fa'ama'i	AlTa
Tulaga	Alumini-Tantalum
Mama	99.9%, 99.95%, 99.99%
foliga	Papatusi, Column Targets, arc cathodes, Custom-faia
Gaosiga Fa'agasologa	Li'umea gaogao, PM
Avanoa Tele	L≤200mm，W≤200mm

Auina imeli ia matou

Fa'amatalaga Oloa

Faailoga o oloa

O sini e saunia e ala i le faʻafefiloi o le Aluminum ma le Tantalum powders poʻo le faʻafefeteina o le gaogao ma sosoo ai ma le faʻapipiʻiina i le mamafa atoa. O mea fa'apipi'i fa'apea e fa'asili ona filifili ma fa'atupu i le fa'atusa e mana'omia.

Aluminum Tantalum sputtering sini e maualuga le mama, tutusa microstructure ma conductivity lelei. E faʻaaogaina lautele i le faʻavaeina o ata manifinifi mo faʻasalalauga faʻaaliga laulau mafolafola. Aluminum Tantalum e mafai foi ona faʻaopoopo e maua ai le maualuga o le faʻaogaina o le Titanium alloy e faʻaleleia ai le maualuga o le vevela.

O mea le mama o le Al-Ta alloy

fatuga	Anotusi(%）
	Ta	Fe	Si	C	O
AlTa60	55.0~65.0	≤0.05	≤0.02	≤0.01	≤0.05
AlTa70	65.0~75.0	≤0.05	≤0.02	≤0.01	≤0.05

Rich Special Materials e fa'apitoa i le Gausia o Sputtering Target ma e mafai ona gaosia Aluminum Tantalum Sputtering Materials e tusa ai ma fa'amatalaga a tagata fa'atau. O a matou oloa o loʻo faʻaalia ai mea faʻainisinia sili ona lelei, faʻapipiʻi tutusa, faʻalelei luga e aunoa ma se faʻamavaeina, pores poʻo taʻe. Mo nisi fa'amatalaga, fa'amolemole fa'afeso'ota'i matou.

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