Short Lead Time for High Quality Elemental Materials - Tisi Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
Short Lead Time for High Quality Elemental Materials - Tisi Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
Titanium Silicon Sputtering Target Description
A super-hard Nitride coating could be formed when Titanium Silicon combined with Nitrogen gas during deposition process. The Silicon element present ensures high oxidation resistance behavior, whiles Titanium – hardness. It could exhibit excellent wear resistance property even at highly elevated temperatures. Cutting tools deposited by TiSiN coating is ideal for high-speed and hard milling, especially in dry cutting, and could deal with some super alloys, like Nickel and Titanium base alloys.
Our typical TiSi targets and their properties
|
Ti-15Si at% |
Ti-20Si at% |
Ti-25Si at% |
Ti-30Si at% |
|
|
Purity (%) |
99.9 |
99.9 |
99.9 |
99.9 |
|
Density（g/cm3） |
4.4 |
4.35 |
4.3 |
4.25 |
|
Grain Size(µm) |
200/100 |
100 |
100 |
100 |
|
Process |
VAR/HIP |
HIP |
HIP |
HIP |
Our company has many years of experience of manufacturing sputtering targets for mold cutting tools. Ti-15Si at%, fabricated by vacuum melting, has homogeneous structure, high purity and low gas content. Besides, we also supply Ti-15Si at%、Ti-20Si at% and Ti-25Si at% produced by means of power metallurgy. Our TiSi targets have excellent mechanical properties, making them unsusceptible to cracking and structural failure.
Titanium Silicon Sputtering Target Packaging
Our Titanium Silicon sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
Get Contact
RSM’s Titanium Silicon sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
Product detail pictures:
Related Product Guide:
With our outstanding administration, powerful technical capability and strict top quality handle procedure, we go on to provide our purchasers with reliable good quality, reasonable selling prices and excellent services. We goal at becoming certainly one of your most responsible partners and earning your gratification for Short Lead Time for High Quality Elemental Materials - Tisi Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Portugal, Ukraine, Latvia, In order to meet more market demands and long-term development, a 150, 000-square-meter new factory is under construction, which will be put into use in 2014. Then, we shall own a large capacity of producing. Of course, we are going to continue improving the service system to meet the requirements of customers, bringing health, happiness and beauty to everyone.
By Alice from Sydney - 2017.08.18 11:04
It is really lucky to meet such a good supplier, this is our most satisfied cooperation, I think we will work again!
By Rae from Burundi - 2017.03.28 12:22
