Wholesale Renewable Design for Nd Sputtering Target - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Manufacturer and Supplier

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Together with the "Client-Oriented" enterprise philosophy, a arduous good quality control technique, sophisticated producing equipment and a sturdy R&D staff, we generally offer superior quality merchandise, superb solutions and aggressive rates for Co-Precipitation , Fecr Sputtering Target , Ruthenium Ru Sputtering Target , We warmly welcome customers from all over the world for any kind of cooperation with us to build a mutual benefit future. We are devoting ourselves wholeheartedly to offer customers the best service.

Renewable Design for Nd Sputtering Target - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

Aluminum Chromium Sputtering Target Description

Aluminum chromium sputtering target from Rich Special Materials is an alloy sputtering material containing Al and Cr. Thus, the Aluminum chromium sputter target has the advantages of these two elements.

Aluminum, also called aluminum, is a chemical element that originated from the Latin name for alum, ‘alumen’ meaningbitter salt. It was first mentioned in 1825 and observed by H.C.Ã˜rsted. The isolation was later accomplished and announced by H.C.Ã˜rsted. “Al” is the canonical chemical symbol of aluminum. Its atomic number in the periodic table of elements is 13 with a location at Period 3 and Group 13, belonging to the p-block. The relative atomic mass of aluminum is 26.9815386(8) Dalton, the number in the brackets indicating the uncertainty.

Chromium is a chemical element that originated from the Greek ‘chroma’, meaning colour. It was early used before 1 AD and discovered by Terracotta Army. “Cr” is the canonical chemical symbol of chromium. Its atomic number in the periodic table of elements is 24 with a location at Period 4 and Group 6, belonging to the d-block. The relative atomic mass of chromium is 51.9961(6) Dalton, the number in the brackets indicating the uncertainty.

Our typical AlCr targets and their properties

	Cr-70Al at%	Cr-60Al at%	Cr-50Al at%
Purity (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Density（g/cm³）	3.7	4.35	4.55
Grain Size(µm)	100/50	100/50	100/50
Process	HIP	HIP	HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Silicon Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.

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Our personnel are always in the spirit of "continuous improvement and excellence", and with the superior quality products, favorable price and good after-sales services, we try to win every customer's trust for Renewable Design for Nd Sputtering Target - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: kazakhstan, Colombia, French, Due to our strict pursues in quality, and after-sale service, our product gets more and more popular around the world. Many clients came to visit our factory and place orders. And there are also many foreign friends who came for sight seeing, or entrust us to buy other stuff for them. You are most welcome to come to China, to our city and to our factory!

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