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Rapid Delivery for Ti Planar Sputtering Target for Vacuum/PVD Coating

Titanium

Short Description:

Category

Metal Sputtering Target

Chemical Formula

Ti

Composition

Titanium

Purity

99.9%,99.95%,99.99%

Shape

Plates,Column Targets,arc cathodes,Custom-made

Production Process

Vacuum Melting

Available Size

L≤2000mm,W≤200mm


Product Detail

Product Tags

We keep improving and perfecting our merchandise and repair. At the same time, we get the job done actively to do research and progress for Rapid Delivery for Ti Planar Sputtering Target for Vacuum/PVD Coating, We wish to take this opportunity to ascertain long-term business interactions with clientele from all over the entire world.
We keep improving and perfecting our merchandise and repair. At the same time, we get the job done actively to do research and progress for China ti target and ti sputtering, Our goods have national accreditation requirements for qualified, high quality products and solutions, affordable value, was welcomed by people today all over the world. Our items will continue to enhance within the order and look forward to cooperation with you, Ought to any of those items be of interest to you, you should letus know. We are going to be content to provide you a quotation up on receipt of your detailed needs.

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Titanium Sputtering Target Description

Titanium is a chemical element with the symbol Ti and atomic number 22. It is a lustrous transition metal with a silver color. Its melting point is (1660±10)℃, boiling point is 3287℃. It has light weight, high hardness, corrosion resistance to all types of chlorine chemicals.

Titanium resists corrosion by seawater, and it can dissolve in both acidic and in alkaline media.

Titanium alloy is extensively used in aerospace, chemical engineering, petroleum, medicine, construction, and other fields for its outstanding properties, like low density, thermal conductivity and excellent corrosion resistance, weldability and biocompatibility.

Titanium could absorb hydrogen, CH4 and Co2 gases, and it is widely used in high vacuum and ultra-high vacuum systems. Titanium sputtering target could be used for the fabrication of LSI, VLSI and ULSI circuit network, or barrier metal materials.

Titanium Sputtering Target Packaging

Our Titanium sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

RSM’s Titanium sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.

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We keep improving and perfecting our merchandise and repair. At the same time, we get the job done actively to do research and progress for Rapid Delivery for High Purity Ti Planar Sputtering Target for Vacuum/PVD Coating, We wish to take this opportunity to ascertain long-term business interactions with clientele from all over the entire world.
Rapid Delivery for China ti target and ti sputtering, Our goods have national accreditation requirements for qualified, high quality products and solutions, affordable value, was welcomed by people today all over the world. Our items will continue to enhance within the order and look forward to cooperation with you, Ought to any of those items be of interest to you, you should letus know. We are going to be content to provide you a quotation up on receipt of your detailed needs.


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