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Professional Factory for China Factory Price Chrome Sputtering Target Customized

Chrome Aluminum Silicon

Short Description:

Category

Alloy Sputtering Target

Chemical Formula

CrAlSi

Composition

Chrome aluminum silicon

Purity

99.9%,99.95%,99.99%

Shape

Plates,Column Targets,arc cathodes,Custom-made

Production Process

Vacuum Melting,PM

Available Size

L≤1000mm,W≤200mm


Product Detail

Product Tags

Our solutions are greatly recognized and reliable by customers and will fulfill continuously altering financial and social requirements for Professional Factory for China Factory Price Chrome Sputtering Target Customized, We warmly welcome all intrigued clients to call us for additional details.
Our solutions are greatly recognized and reliable by customers and will fulfill continuously altering financial and social requirements for China Chromium Target, Chrome Plate, Our company always provides good quality and reasonable price for our customers. In our efforts, we already have many shops in Guangzhou and our products have won praise from customers worldwide. Our mission has always been simple: To delight our customers with best quality hair items and deliver on time. Welcome new and old customers to contact us for the future long term business relationships.

Chronium Aluminum Silicon Sputtering Target Description

The fabrication of Chronium Aluminum Silicon Sputtering Targets comprises the following steps:
1.Vacuum melting of Silicon, Aluminum and Chronium to obtain step alloys.
2.Powder grinding and mixing.
3.Hot isostatic pressing treatment to obtain the chromium Aluminum silicon alloy sputtering target.
Chronium Aluminum Silicon Sputtering Targets are extensively used in cutting tools and molds, owing to its wear resistance and high temperature oxidation resistance to improve the film performance.
An amorphous Si3N4 phase would be formed during the process of PVD of CrAlSi targets. Due to the incorporation of amorphous Si3N4 phase, the growth of the grain size could be restrained and improve the high temperature oxidation resistance property.

Chronium Aluminum Silicon Sputtering Target Packaging

Our Chronium Aluminum Silicon sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation

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RSM’s Chronium Aluminum Silicon sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.Our solutions are greatly recognized and reliable by customers and will fulfill continuously altering financial and social requirements for Professional Factory for China Factory Price Chrome Sputtering Target Customized, We warmly welcome all intrigued clients to call us for additional details.
Professional Factory for China Chromium Target, Chrome Plate, Our company always provides good quality and reasonable price for our customers. In our efforts, we already have many shops in Guangzhou and our products have won praise from customers worldwide. Our mission has always been simple: To delight our customers with best quality hair items and deliver on time. Welcome new and old customers to contact us for the future long term business relationships.


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