Professional China metal alloy chromium aluminum CrAl sputtering target

To be the stage of realizing dreams of our employees! To build a happier, more united and more professional team! To reach a mutual benefit of our customers, suppliers, the society and ourselves for Professional China metal alloy chromium aluminum CrAl sputtering target, High-quality is factory’ everyday living , Focus on customer’ demand is the source of business survival and development, We adhere to honesty and superior faith doing work attitude, wanting forward on your coming !
To be the stage of realizing dreams of our employees! To build a happier, more united and more professional team! To reach a mutual benefit of our customers, suppliers, the society and ourselves for , Our advanced equipment, excellent quality management, research and development ability make our price down. The price we offering may not be the lowest, but we guarantee it is absolutely competitive! Welcome to contact us immediately for future business relationship and mutual success!

Chronium Aluminum Silicon Sputtering Target Description

The fabrication of Chronium Aluminum Silicon Sputtering Targets comprises the following steps:
1.Vacuum melting of Silicon, Aluminum and Chronium to obtain step alloys.
2.Powder grinding and mixing.
3.Hot isostatic pressing treatment to obtain the chromium Aluminum silicon alloy sputtering target.
Chronium Aluminum Silicon Sputtering Targets are extensively used in cutting tools and molds, owing to its wear resistance and high temperature oxidation resistance to improve the film performance.
An amorphous Si3N4 phase would be formed during the process of PVD of CrAlSi targets. Due to the incorporation of amorphous Si3N4 phase, the growth of the grain size could be restrained and improve the high temperature oxidation resistance property.

Chronium Aluminum Silicon Sputtering Target Packaging

Our Chronium Aluminum Silicon sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation

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RSM’s Chronium Aluminum Silicon sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.To be the stage of realizing dreams of our employees! To build a happier, more united and more professional team! To reach a mutual benefit of our customers, suppliers, the society and ourselves for Professional China metal alloy chromium aluminum CrAl sputtering target, High-quality is factory’ everyday living , Focus on customer’ demand is the source of business survival and development, We adhere to honesty and superior faith doing work attitude, wanting forward on your coming !
Professional China , Our advanced equipment, excellent quality management, research and development ability make our price down. The price we offering may not be the lowest, but we guarantee it is absolutely competitive! Welcome to contact us immediately for future business relationship and mutual success!