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Professional China Igzo Sputtering Target - Vacuum Coating Material CoFeTaZr target Cobalt-Iron-Tantalum-Zirconium alloy target Magnetron Sputtering target – Rich

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Professional China Igzo Sputtering Target - Vacuum Coating Material CoFeTaZr target Cobalt-Iron-Tantalum-Zirconium alloy target Magnetron Sputtering target – Rich Detail:

Vacuum Coating Material CoFeTaZr target Cobalt-Iron-Tantalum-Zirconium alloy target Magnetron Sputtering target,
CoFeTaZr target,
Chromium cobalt sputtering target from Rich Special Materials is a silvery alloy sputtering material containing Cr and Co.

Chromium

Chromium is a chemical element that originated from the Greek ‘chroma’, meaning color. It was early used before 1 AD and discovered by Terracotta Army. “Cr” is the canonical chemical symbol of chromium. Its atomic number in the periodic table of elements is 24 with a location at Period 4 and Group 6, belonging to the d-block. The relative atomic mass of chromium is 51.9961(6) Dalton, the number in the brackets indicating the uncertainty.

Cobalt

Cobalt is a chemical element that originated from the German word ‘kobald’, meaning goblin. It was first mentioned in 1732 and observed by G. Brandt. “Co” is the canonical chemical symbol of cobalt. Its atomic number in the periodic table of elements is 27 with a location at Period 4 and Group 9, belonging to the d-block. The relative atomic mass of cobalt is 58.933195(5) Dalton, the number in the brackets indicating the uncertainty.

Chronium Cobalt Sputtering Targets are manufactured by means of Vacuum Melting and PM. CrCo has superior specific strength and has been used in various fields where high wear-resistance was needed including aerospace industry, cutlery, bearings, blades, etc.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Cobalt Sputtering Materials according to Customers’ specifications. For more information, please contact us.Zirconium iron cobalt tantalum target material is made of high purity cobalt, iron, tantalum, zirconium by high vacuum melting of target material, the technology can effectively control the oxygen content of the target product and the use of special cooling of the mold, is alloy liquid rapid cooling, the alloy target material uniform structure, uniform composition distribution, small, through high temperature and high pressure densification processing, make the material is very dense, This provides a guarantee for the sputtering of high quality films. After heat treatment, the magnetic head ratio (PTF) of the target is significantly increased, and the thin films deposited by the cobalt-iron-tantalum-zirconium target are important soft magnetic layers in the vertical magnetic recording film.


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Professional China  Igzo Sputtering Target - Vacuum Coating Material CoFeTaZr target Cobalt-Iron-Tantalum-Zirconium alloy target Magnetron Sputtering target – Rich detail pictures


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Trustworthy good quality and excellent credit score standing are our principles, which will help us at a top-ranking position. Adhering towards the tenet of "quality first, buyer supreme" for Professional China Igzo Sputtering Target - Vacuum Coating Material CoFeTaZr target Cobalt-Iron-Tantalum-Zirconium alloy target Magnetron Sputtering target – Rich , The product will supply to all over the world, such as: Mecca, Buenos Aires, Hyderabad, Furthermore, all of our items are manufactured with advanced equipment and strict QC procedures in order to ensure high quality. If you are interested in any of our goods, please don't hesitate to contact us. We will do our best to meet your needs.
  • The company leader recept us warmly, through a meticulous and thorough discussion, we signed a purchase order. Hope to cooperate smoothly
    5 Stars By Victor Yanushkevich from Casablanca - 2018.06.21 17:11
    The company can keep up with the changes in this industry market, product updates fast and the price is cheap, this is our second cooperation, it's good.
    5 Stars By Janice from Bulgaria - 2018.11.06 10:04