Price Sheet for CrAlSi Sputtering Target for PVD Coating

Being a result of ours specialty and service consciousness, our corporation has won a very good status amid buyers all over the world for Price Sheet for CrAlSi Sputtering Target for PVD Coating, We will wholeheartedly welcome all purchasers from the industry the two at home and abroad to cooperate hand in hand, and produce a bright foreseeable future jointly.
Being a result of ours specialty and service consciousness, our corporation has won a very good status amid buyers all over the world for China Sputtering Target and Vacuum Coating Material, We look forward to hearing from you, whether you are a returning customer or a new one. We hope you will find what you are looking for here, if not, you should contact us immediately. We pride ourselves on top notch customer service and response. Thank you for your business and support!

Chronium Aluminum Silicon Sputtering Target Description

The fabrication of Chronium Aluminum Silicon Sputtering Targets comprises the following steps:
1.Vacuum melting of Silicon, Aluminum and Chronium to obtain step alloys.
2.Powder grinding and mixing.
3.Hot isostatic pressing treatment to obtain the chromium Aluminum silicon alloy sputtering target.
Chronium Aluminum Silicon Sputtering Targets are extensively used in cutting tools and molds, owing to its wear resistance and high temperature oxidation resistance to improve the film performance.
An amorphous Si3N4 phase would be formed during the process of PVD of CrAlSi targets. Due to the incorporation of amorphous Si3N4 phase, the growth of the grain size could be restrained and improve the high temperature oxidation resistance property.

Chronium Aluminum Silicon Sputtering Target Packaging

Our Chronium Aluminum Silicon sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation

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RSM’s Chronium Aluminum Silicon sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.Being a result of ours specialty and service consciousness, our corporation has won a very good status amid buyers all over the world for Price Sheet for CrAlSi Sputtering Target for PVD Coating, We will wholeheartedly welcome all purchasers from the industry the two at home and abroad to cooperate hand in hand, and produce a bright foreseeable future jointly.
Price Sheet for China Sputtering Target and Vacuum Coating Material, We look forward to hearing from you, whether you are a returning customer or a new one. We hope you will find what you are looking for here, if not, you should contact us immediately. We pride ourselves on top notch customer service and response. Thank you for your business and support!