Original Factory Titanium Ti Sputtering Target - Tial Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
Original Factory Titanium Ti Sputtering Target - Tial Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
Titanium Aluminum Sputtering Target Description
The requirement of the target quality for sputter coating is higher than that of the traditional materials industry. The uniform microstructure of the target directly affects the sputtering performance. We have a completed quality management system and we select high purity raw materials and thoroughly blend them to ensure homogeneity. Titanium Aluminum alloy sputtering target is produced by means of vacuum hot pressing method.
Our Titanium Aluminum sputtering targets could provide an outstanding oxidation-resistant nitride coating, Titanium aluminum nitride (TiAlN). TiAlN is the current mainstream as a film for cutting tools, sliding parts and tribo-coatings. It has high hardness, toughness, wear resistant performance and oxidation temperature.
Our typical TiAl targets and their properties
Ti-75Al at% |
Ti-70Al at% |
Ti-67Al at% |
Ti-60Al at% |
Ti-50Al at% |
Ti-30Al at% |
Ti-20Al at% |
Ti-14Al at% |
|
Purity (%) |
99.7 |
99.7 |
99.7 |
99.7 |
99.8/99.9 |
99.9 |
99.9 |
99.9 |
Density(g/cm3) |
3.1 |
3.2 |
3.3 |
3.4 |
3.63/3.85 |
3.97 |
4.25 |
4.3 |
Grain Size(µm) |
100 |
100 |
100 |
100 |
100/- |
- |
- |
- |
Process |
HIP |
HIP |
HIP |
HIP |
HIP/VAR |
VAR |
VAR |
VAR |
Titanium Aluminum Sputtering Target Packaging
Our Titanium Aluminum sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
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RSM’s Titanium Aluminum sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices.
We could supply a variety of geometric forms: tubes, arc cathodes, planar or custom-made, and wide proportion range of Aluminum. Our products feature excellent mechanical properties, homogeneous microstructure, polished surface with no segregation, pores, or cracks.
We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
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Sticking to the perception of "Creating products of top of the range and earning mates with people today from all over the world", we constantly put the desire of consumers in the first place for Original Factory Titanium Ti Sputtering Target - Tial Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Estonia, Kyrgyzstan, United States, Our aim is to help customers realize their goals. We have been making great efforts to achieve this win-win situation and sincerely welcome you to join us. In a word, when you choose us, you choose a perfect life. Welcome to visit our factory and welcome your order! For further inquiries, you should do not hesitate to contact us.
By Mandy from Indonesia - 2018.09.19 18:37
Good quality and fast delivery, it's very nice. Some products have a little bit problem, but the supplier replaced timely, overall, we are satisfied.
By Elva from Sydney - 2017.06.29 18:55