Online Exporter China Sputtering Target Manufacturer, Cr Target CrAlSi PVD Target

Fast and excellent quotations, informed advisers to help you choose the correct product that suits all your requirements, a short manufacturing time, responsible top quality management and unique services for paying and shipping affairs for Online Exporter China Sputtering Target Manufacturer, Cr Target CrAlSi PVD Target, We give priority to quality and customer satisfaction and for this we follow stringent quality control measures. We have in-house testing facilities where our products are tested on every aspect at different processing stages. Owning to latest technologies, we facilitate our customers with customized production facility.
Fast and excellent quotations, informed advisers to help you choose the correct product that suits all your requirements, a short manufacturing time, responsible top quality management and unique services for paying and shipping affairs for Cr Target CrAlSi PVD Target, Our domestic website’s generated over 50, 000 purchasing orders every year and quite successful for internet shopping in Japan. We would be happy to have an opportunity to do business with your company. Looking forward to receiving your message !

Chronium Aluminum Silicon Sputtering Target Description

The fabrication of Chronium Aluminum Silicon Sputtering Targets comprises the following steps:
1.Vacuum melting of Silicon, Aluminum and Chronium to obtain step alloys.
2.Powder grinding and mixing.
3.Hot isostatic pressing treatment to obtain the chromium Aluminum silicon alloy sputtering target.
Chronium Aluminum Silicon Sputtering Targets are extensively used in cutting tools and molds, owing to its wear resistance and high temperature oxidation resistance to improve the film performance.
An amorphous Si3N4 phase would be formed during the process of PVD of CrAlSi targets. Due to the incorporation of amorphous Si3N4 phase, the growth of the grain size could be restrained and improve the high temperature oxidation resistance property.

Chronium Aluminum Silicon Sputtering Target Packaging

Our Chronium Aluminum Silicon sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation

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RSM’s Chronium Aluminum Silicon sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.Fast and excellent quotations, informed advisers to help you choose the correct product that suits all your requirements, a short manufacturing time, responsible top quality management and unique services for paying and shipping affairs for Online Exporter China Sputtering Target Manufacturer, Cr Target CrAlSi PVD Target, We give priority to quality and customer satisfaction and for this we follow stringent quality control measures. We have in-house testing facilities where our products are tested on every aspect at different processing stages. Owning to latest technologies, we facilitate our customers with customized production facility.
Online Exporter China Sputtering Target Manufacturer, Our domestic website’s generated over 50, 000 purchasing orders every year and quite successful for internet shopping in Japan. We would be happy to have an opportunity to do business with your company. Looking forward to receiving your message !