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One of Hottest for High Purity Metal Al Aluminium Sputtering Target with Good Price

Aluminum-Tantalum

Short Description:

Category

Alloy Sputtering Target

Chemical Formula

AlTa

Composition

Aluminum-Tantalum

Purity

99.9%,99.95%,99.99%

Shape

Plates,Column Targets,arc cathodes,Custom-made

Production Process

Vacuum Melting,PM

Available Size

L≤200mm,W≤200mm


Product Detail

Product Tags

We attempt for excellence, company the customers”, hopes to be the top cooperation team and dominator company for personnel, suppliers and customers, realizes price share and continual marketing for One of Hottest for High Purity Metal Al Aluminium Sputtering Target with Good Price, We are ready to cooperate with organization pals from at your home and abroad and make a great long term together.
We attempt for excellence, company the customers”, hopes to be the top cooperation team and dominator company for personnel, suppliers and customers, realizes price share and continual marketing for China Al Sputtering Target and High Purity Metal Al, At Current, our solutions have been exported to more than sixty countries and different regions, such as Southeast Asia, America, Africa, Eastern Europe, Russia, Canada etc. We sincerely hope to establish wide contact with all potential customers both in China and the rest part of the world.
The targets are prepared by blending Aluminum and Tantalum powders or vacuum melting followed by compaction to full density. The thus compacted materials are optionally sintered and are then formed into the desired target shape.

Aluminum Tantalum sputtering target has high purity, homogeneous microstructure and excellent conductivity. It is widely used in the formation of thin films for flat panel display industry. Aluminum Tantalum could also be added to produce high performance Titanium alloy to improve its high-temperature suitability.

Impurity content of Al-Ta alloy

composition

Content(%)

Ta

Fe

Si

C

O

AlTa60

55.0~65.0

≤0.05

≤0.02

≤0.01

≤0.05

AlTa70

65.0~75.0

≤0.05

≤0.02

≤0.01

≤0.05

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Tantalum Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.We attempt for excellence, company the customers”, hopes to be the top cooperation team and dominator company for personnel, suppliers and customers, realizes price share and continual marketing for One of Hottest for High Purity Metal Al Aluminium Sputtering Target with Good Price, We are ready to cooperate with organization pals from at your home and abroad and make a great long term together.
One of Hottest for China Al Sputtering Target and High Purity Metal Al, At Current, our solutions have been exported to more than sixty countries and different regions, such as Southeast Asia, America, Africa, Eastern Europe, Russia, Canada etc. We sincerely hope to establish wide contact with all potential customers both in China and the rest part of the world.


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