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OEM/ODM China Titanium Ti Sputtering Target High Purity 99.99%

Titanium

Short Description:

Category

Metal Sputtering Target

Chemical Formula

Ti

Composition

Titanium

Purity

99.9%,99.95%,99.99%

Shape

Plates,Column Targets,arc cathodes,Custom-made

Production Process

Vacuum Melting

Available Size

L≤2000mm,W≤200mm


Product Detail

Product Tags

Our concentrate on should be to consolidate and enhance the quality and service of present products, meanwhile consistently produce new products to meet unique customers’ demands for OEM/ODM China Titanium Ti Sputtering Target High Purity 99.99%, We’re self-assured to create wonderful achievements while in the potential. We’ve been hunting forward to becoming one of your most trustworthy suppliers.
Our concentrate on should be to consolidate and enhance the quality and service of present products, meanwhile consistently produce new products to meet unique customers’ demands for China Multi Arc Sputtering Target and Sputtering Target, The company has perfect management system and after-sales service system. We devote ourselves to building a pioneer in the filter industry. Our factory is willing to cooperate with different customers domestic and overseas to gain better and better future.

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Titanium Sputtering Target Description

Titanium is a chemical element with the symbol Ti and atomic number 22. It is a lustrous transition metal with a silver color. Its melting point is (1660±10)℃, boiling point is 3287℃. It has light weight, high hardness, corrosion resistance to all types of chlorine chemicals.

Titanium resists corrosion by seawater, and it can dissolve in both acidic and in alkaline media.

Titanium alloy is extensively used in aerospace, chemical engineering, petroleum, medicine, construction, and other fields for its outstanding properties, like low density, thermal conductivity and excellent corrosion resistance, weldability and biocompatibility.

Titanium could absorb hydrogen, CH4 and Co2 gases, and it is widely used in high vacuum and ultra-high vacuum systems. Titanium sputtering target could be used for the fabrication of LSI, VLSI and ULSI circuit network, or barrier metal materials.

Titanium Sputtering Target Packaging

Our Titanium sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.

Get Contact

RSM’s Titanium sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.

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Our concentrate on should be to consolidate and enhance the quality and service of present products, meanwhile consistently produce new products to meet unique customers’ demands for OEM/ODM China Titanium Ti Sputtering Target High Purity 99.99%, We’re self-assured to create wonderful achievements while in the potential. We’ve been hunting forward to becoming one of your most trustworthy suppliers.
OEM/ODM China China Multi Arc Sputtering Target and Sputtering Target, The company has perfect management system and after-sales service system. We devote ourselves to building a pioneer in the filter industry. Our factory is willing to cooperate with different customers domestic and overseas to gain better and better future.


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