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OEM Factory for Titanium Dioxide Pellets - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich

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It adheres to the tenet "Honest, industrious, enterprising, innovative" to develop new products constantly. It regards customers, success as its own success. Let us develop prosperous future hand in hand for Terbium Sputtering Target , Reactive Sputtering , Ag Sputtering Target , If you are interested within our products and solutions, you should come to feel absolutely free to ship us your inquiry. We sincerely hope to ascertain win-win company relationships with you.
OEM Factory for Titanium Dioxide Pellets - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

Aluminum Chromium Sputtering Target Description

Aluminum chromium sputtering target from Rich Special Materials is an alloy sputtering material containing Al and Cr. Thus, the Aluminum chromium sputter target has the advantages of these two elements.

Aluminum, also called aluminum, is a chemical element that originated from the Latin name for alum, ‘alumen’ meaningbitter salt. It was first mentioned in 1825 and observed by H.C.Ørsted. The isolation was later accomplished and announced by H.C.Ørsted. “Al” is the canonical chemical symbol of aluminum. Its atomic number in the periodic table of elements is 13 with a location at Period 3 and Group 13, belonging to the p-block. The relative atomic mass of aluminum is 26.9815386(8) Dalton, the number in the brackets indicating the uncertainty.

Chromium is a chemical element that originated from the Greek ‘chroma’, meaning colour. It was early used before 1 AD and discovered by Terracotta Army. “Cr” is the canonical chemical symbol of chromium. Its atomic number in the periodic table of elements is 24 with a location at Period 4 and Group 6, belonging to the d-block. The relative atomic mass of chromium is 51.9961(6) Dalton, the number in the brackets indicating the uncertainty.

Our typical AlCr targets and their properties

Cr-70Al at%

Cr-60Al at%

Cr-50Al at%

Purity (%)

99.8/99.9/99.95

99.8/99.9/99.95

99.8/99.9/99.95

Density(g/cm3

3.7

4.35

4.55

Grain Size(µm)

100/50

100/50

100/50

Process

HIP

HIP

HIP

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Silicon Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.


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OEM Factory for Titanium Dioxide Pellets - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich detail pictures


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The organization keeps on the procedure concept "scientific management, high quality and efficiency primacy, purchaser supreme for OEM Factory for Titanium Dioxide Pellets - Alcr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Ukraine, Provence, San Diego, Our products are mainly exported to Southeast Asia, the Middle East, North America and Europe. Our quality is surely guaranteed. If you are interested in any of our products or would like to discuss a custom order, please feel free to contact us. We are looking forward to forming successful business relationships with new clients around the world in the near future.
  • This enterprise in the industry is strong and competitive, advancing with the times and develop sustainable, we are very pleased to have a opportunity to cooperate!
    5 Stars By Michaelia from Danish - 2017.09.16 13:44
    This is a reputable company, they have a high level of business management, good quality product and service, every cooperation is assured and delighted!
    5 Stars By Erin from Macedonia - 2018.06.18 19:26