OEM China Copper Cu Sputtering Target - Cralw Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
OEM China Copper Cu Sputtering Target - Cralw Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
Chrome Aluminum Tungsten sputtering target is fabricated by means of powder metallurgy to achieve high purity, homogeneous microstructure, high density and high electrical conductivity.
Chrome Aluminum Tungsten alloy is a perfect material for Interconnects and electrodes industries. It has smooth surface, high deposition rate, toughness, dielectric strength, and could be well blend with the substrate material.
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Tungsten Sputtering Materials according to Customers’ specifications. Our products feature high purity, homogeneous structure, high density with no segregation, pores or cracks. For more information, please contact us.
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Bear "Customer first, High quality first" in mind, we perform closely with our consumers and provide them with efficient and experienced services for OEM China Copper Cu Sputtering Target - Cralw Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Jakarta, Argentina, Provence, Our company regards "reasonable prices, efficient production time and good after-sales service" as our tenet. We hope to cooperate with more customers for mutual development and benefits. We welcome potential buyers to contact us.
By Kim from Cannes - 2017.03.28 12:22
In China, we have purchased many times, this time is the most successful and most satisfactory, a sincere and realiable Chinese manufacturer!
By Dana from United Kingdom - 2017.01.28 19:59
