OEM China Copper Cu Sputtering Target - Cofetazr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
OEM China Copper Cu Sputtering Target - Cofetazr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
Cobalt Iron Tantalum Zirconium sputtering target is fabricated by means of vacuum melting. This production process could effectively protect major constituents from oxidation and ensure homogenous microstructure, uniformed grain size and high consistency of the deposited films.
After heat treatment, the PTF of the target could be significantly improved, so it is often used for the soft magnetic layer material in perpendicular magnetic recording layers.
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Cobalt Iron Tantalum Zirconium Sputtering Materials according to Customers’ specifications. For more information, please contact us.
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By Betty from Czech Republic - 2017.09.22 11:32
The customer service staff's answer is very meticulous, the most important is that the product quality is very good, and packaged carefully, shipped quickly!
By Hilda from Uganda - 2018.06.28 19:27