Takulandilani kumasamba athu!

NiTa Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Nickel Tantalum

Kufotokozera Kwachidule:

Gulu

Aloyi Sputtering Target

Chemical Formula

NdiTa

Kupanga

Nickel tantalum

Chiyero

99.9%, 99.95%, 99.99%

Maonekedwe

Mbale, Zolinga za Column, arc cathodes, Zopangidwa mwamakonda

Njira Yopanga

Kusungunuka kwa Vuto, PM

Kukula komwe kulipo

L≤200mm, W≤200mm


Tsatanetsatane wa Zamalonda

Zolemba Zamalonda

Nickel Tantalum Sputtering Target amapangidwa pogwiritsa ntchito vacuum kusungunuka kapena zitsulo za ufa. Iwo ali mkulu chiyero ndi homogeneous microstructure.

Nickel Tantalum Sputtering Target amagwiritsidwa ntchito kwambiri muzamlengalenga, ndege, mafakitale apanyanja. Kukana kwake kwabwino kwa kutentha kwapamwamba kumachokera ku kuchuluka kwa Tantalum komwe kuli mu alloy, yomwe imakhala ndi kutentha kwakukulu kwa 3000 ° C. Aluminium, Yttrium ndi Chronium nthawi zambiri amawonjezeredwa kuti apititse patsogolo zinthu.

Rich Special Materials amagwira ntchito pa Manufacture of Sputtering Target ndipo amatha kupanga Nickel Tantalum Sputtering Materials molingana ndi zomwe Makasitomala afuna. Kuti mudziwe zambiri, chonde titumizireni.


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