Magnetron sputtering № ndi njira yatsopano yokutira nthunzi yakuthupi, poyerekeza ndi njira yopangira nthunzi yam'mbuyomo, ubwino wake muzinthu zambiri ndi wodabwitsa kwambiri. Monga teknoloji yokhwima, magnetron sputtering yagwiritsidwa ntchito m'madera ambiri.
Magnetron sputtering mfundo:
Orthogonal magnetic field ndi magetsi amawonjezeredwa pakati pa sputtered target pole (cathode) ndi anode, ndipo mpweya wofunikira wa inert (kawirikawiri Ar gas) umadzazidwa mu chipinda cha vacuum chapamwamba. Maginito okhazikika amapanga maginito a 250-350 gaus pamwamba pa zomwe akufuna, ndipo gawo la orthogonal electromagnetic field limapangidwa ndi magetsi apamwamba kwambiri. Pansi pa mphamvu ya magetsi, Ar gasi ionization mu ma ion abwino ndi ma elekitironi, chandamale ndipo imakhala ndi kukakamiza koyipa, kuchokera pa chandamale kuchokera pamtengo ndi mphamvu ya maginito ndi kuchuluka kwa mwayi wogwiritsa ntchito mpweya wa ionization, kumapanga plasma yayikulu kwambiri pafupi ndi cathode, Arion pansi pa zochita za lorentz force, fulumirani kuwulukira pamalo omwe mukufuna, kuphulitsa chandamale pa liwiro lalitali, Ma atomu ophulika pa chandamale amatsata mfundo ya kutembenuka kwachangu ndikuwulukira kutali ndi chandamale ndi mphamvu yayikulu ya kinetic kupita ku filimu yoyika gawo lapansi.
Magnetron sputtering nthawi zambiri amagawidwa m'mitundu iwiri: DC sputtering ndi RF sputtering. Mfundo ya DC sputtering zida ndi yosavuta, ndipo mlingo wake ndi wofulumira pamene sputtering zitsulo. Kugwiritsidwa ntchito kwa RF sputtering ndikokulirapo, kuphatikiza kutulutsa zida zopangira zinthu, komanso kutayira zinthu zopanda ma conductive, komanso kutulutsa kokhazikika kwa ma oxides, nitrides ndi ma carbides ndi zida zina. Ngati ma frequency a RF akuwonjezeka, amakhala microwave plasma sputtering. Pakali pano, electron cyclotron resonance (ECR) mtundu wa microwave sputtering wa plasma amagwiritsidwa ntchito kwambiri.
Magnetron sputtering coating chandamale:
zitsulo sputtering chandamale chandamale, zokutira aloyi sputtering zokutira, ceramic sputtering zokutira, boride ceramic sputtering chandamale, carbide ceramic sputtering chandamale, fluoride ceramic sputtering chandamale, nitride ceramic sputtering chandamale, oxide ceramic chandamale, selenide ceramic sputtering chandamale. silika ceramic sputtering chandamale zipangizo, sulfide ceramic sputtering chandamale, Telluride ceramic sputtering target, ena ceramic target, chromium-doped silicon oxide ceramic target (CR-SiO), indium phosphide target (InP), lead arsenide target (PbAs), indium arsenide target (InAs).
Nthawi yotumiza: Aug-03-2022