Ndi Mitundu Yanji ya Magnetron Sputtering Target

Tsopano ogwiritsa ntchito ambiri amamvetsetsa mitundu ya zolinga ndintchito zake, koma kugawikana kwake sikungakhale komveka bwino. Tsopano tiyeniRSM injiniya kugawana nanukulowetsedwa kwina Zolinga za magnetron sputtering.

Chandamale cha sputtering: chandamale choyatira chachitsulo, chandamale cha alloy sputtering, chandamale cha sputtering cha ceramic, chandamale cha sputtering cha ceramic, chandamale cha sputtering cha carbide ceramic, chandamale cha fluoride ceramic sputtering target, nitride ceramic sputtering target, oxide ceramic target, oxide ceramic sputtering target, selenide ceramic sputtering chandamale. target, sulfide ceramic sputtering target, telluride ceramic sputtering target, zina za ceramic targets, Chromium doped silicon oxide ceramic target (CR SiO), indium phosphide target (INP), lead arsenide target (pbas), indium arsenide target (InAs).

Magnetron sputtering nthawi zambiri amagawidwa m'mitundu iwiri: DC sputtering ndi RF sputtering. Mfundo ya zida za DC sputtering ndi yosavuta, ndipo mlingo wake umakhalanso wachangu pamene sputtering zitsulo. RF sputtering imagwiritsidwa ntchito kwambiri. Kuphatikiza pa sputtering conductive data, imathanso sputter non-conductive data. Chandamale cha sputtering itha kugwiritsidwanso ntchito ngati sputtering yokhazikika pokonzekera zambiri monga ma oxides, nitrides ndi carbides. Ngati ma frequency a RF awonjezeka, amakhala microwave plasma sputtering. Pakalipano, electron cyclotron resonance (ECR) microwave sputtering ya plasma imagwiritsidwa ntchito kwambiri.