Mitundu ya Magnetron Sputtering Target

Ndi kuchuluka kwa kufunikira kwa msika, mitundu yochulukirachulukira ya sputtering imasinthidwa pafupipafupi. Zina ndizodziwika bwino ndipo zina sizodziwika kwa makasitomala. Tsopano, tikufuna kugawana nanu zomwe ndi mitundu ya magnetron sputtering targets.

Chandamale cha sputtering chili ndi mitundu iyi: chandamale choyatira chachitsulo, chandamale choyatira cha aloyi, chandamale cha sputtering cha ceramic, chandamale cha sputtering cha boride ceramic, chandamale cha sputtering cha carbide ceramic, chandamale cha fluoride ceramic sputtering target, nitride ceramic sputtering target, oxide ceramic target, selenide ceramic targeting. , silika ceramic sputtering chandamale, sulfide ceramic sputtering target, telluride ceramic sputtering target, zina za ceramic targets, Chromium doped silicon oxide ceramic target (CR SiO), indium phosphide target (INP), lead arsenide target (pbas), indium arsenide target (InAs).

Magnetron sputtering nthawi zambiri amagawidwa m'mitundu iwiri: DC sputtering ndi RF sputtering. Mfundo ya zida za DC sputtering ndi yosavuta, ndipo mlingo wake umakhalanso wachangu pamene sputtering zitsulo. RF sputtering imagwiritsidwa ntchito kwambiri. Kuphatikiza pa sputtering conductive data, imathanso sputter non-conductive data. Nthawi yomweyo, chandamale cha sputtering chimapanganso kutulutsa kokhazikika kuti akonzeretu zinthu zambiri monga ma oxides, nitrides ndi carbides. Ngati ma frequency a RF awonjezeka, amakhala microwave plasma sputtering. Pakalipano, electron cyclotron resonance (ECR) microwave sputtering ya plasma imagwiritsidwa ntchito kwambiri.