Ntchito ndi mfundo ya sputtering chandamale

Ponena za kugwiritsa ntchito ndi mfundo yaukadaulo wa sputtering chandamale, makasitomala ena adafunsana ndi RSM, tsopano chifukwa cha vutoli lomwe lidakhudzidwa kwambiri, akatswiri aukadaulo amagawana chidziwitso china chokhudzana.

　　Sputtering target application:

Tinthu tating'onoting'ono (monga ma argon ions) timaphulitsa malo olimba, kuchititsa kuti tinthu tating'ono tating'ono, monga ma atomu, mamolekyu kapena mitolo kuthawa pamwamba pa chinthu chotchedwa "sputtering". Mu zokutira za magnetron sputtering, ma ion abwino opangidwa ndi argon ionization nthawi zambiri amagwiritsidwa ntchito powombera cholimba (chandamale), ndipo ma atomu osalowerera ndale amayikidwa pagawo laling'ono (workpiece) kuti apange filimu wosanjikiza. Magnetron sputtering zokutira ali ndi makhalidwe awiri: "otsika kutentha" ndi "mwachangu".

　　Magnetron sputtering mfundo:

Orthogonal magnetic field ndi magetsi amawonjezeredwa pakati pa sputtered target pole (cathode) ndi anode, ndipo mpweya wofunikira wa inert (kawirikawiri Ar gas) umadzazidwa mu chipinda cha vacuum chapamwamba. Maginito okhazikika amapanga maginito a 250-350 Gauss pamwamba pa zomwe akufuna, ndipo amapanga gawo la orthogonal electromagnetic field ndi mphamvu yamagetsi yamagetsi.

Pansi pa mphamvu yamagetsi, Ar gasi imalowetsedwa kukhala ma ion ndi ma electron, ndipo pali kukakamizidwa kwina koipa pa chandamale, kotero kuti ma elekitironi omwe amachokera kumtengowo amakhudzidwa ndi mphamvu ya maginito ndi mwayi wa ionization wa ntchitoyo. gasi ukuwonjezeka. Plasma yamphamvu kwambiri imapangidwa pafupi ndi cathode, ndipo ma Arion amathamangira kumalo omwe chandamale mothandizidwa ndi mphamvu ya Lorentz ndikuphulitsa chandamale pa liwiro lalikulu, kotero kuti ma atomu otayika pa chandamale athawe kuchokera pamalo omwe chandamale ndi okwera. mphamvu ya kinetic ndikuwulukira ku gawo lapansi kuti mupange filimu molingana ndi mfundo ya kutembenuka mwachangu.

Magnetron sputtering nthawi zambiri amagawidwa m'mitundu iwiri: DC sputtering ndi RF sputtering. Mfundo ya DC sputtering zida ndi yosavuta, ndipo mlingo wake ndi wofulumira pamene sputtering zitsulo. Kugwiritsidwa ntchito kwa RF sputtering ndikokulirapo, kuphatikiza kutulutsa zida zopangira zinthu, komanso kutayira zinthu zopanda ma conductive, komanso kutulutsa kokhazikika kwa ma oxides, nitrides ndi ma carbides ndi zida zina. Ngati ma frequency a RF akuwonjezeka, amakhala microwave plasma sputtering. Pakali pano, electron cyclotron resonance (ECR) mtundu wa microwave sputtering wa plasma amagwiritsidwa ntchito kwambiri.