Yogulitsa FeCoTa Sputtering Target High Purity Thin Film Pvd Coating Mwambo Wopanga Wopanga ndi Wopereka

Iron Cobalt Tantalum

FeCoTa Sputtering Target High Purity Thin Film Pvd Coating Mwambo Wopangidwa Chithunzi Chowonetsedwa

Kufotokozera Kwachidule:

Gulu	Aloyi Sputtering Target
Chemical Formula	FeCoTa
Kupanga	Iron Cobalt Tantalum
Chiyero	99.9%, 99.95%, 99.99%
Maonekedwe	Mbale, Zolinga za Column, arc cathodes, Zopangidwa mwamakonda
Njira Yopanga	Kusungunuka kwa Vuto, PM
Kukula komwe kulipo	L≤200mm, W≤200mm

Titumizireni imelo

Tsatanetsatane wa Zamalonda

Zolemba Zamalonda

Zolinga za Iron Cobalt Tantalum nthawi zambiri zimapezeka ngati zozungulira komanso zida zamakanema zowonda kwambiri zamakanema ojambulira. Kuchuluka kwa Tantalum komwe kumapezeka mu aloyi kungapangitse tsankho ndikupereka tinthu tating'ono tomwe titha kusungunuka. Timagwiritsa ntchito njira yapadera yopangira yomwe imatha kuwonetsetsa kuti ma microstructure ndi ofanana komanso kukonza makina azinthuzo.

Dzina la malonda		FeCoTa
Fe/wt%		Kusamala	Kusamala	Kusamala
Co/wt%		21.6±0.5	21.9±0.5	20.2±0.5
Ta/wt%		41.1±0.8	39.4±0.8	44.3±0.8
Zitsulo zonyansa(ppm）	Ni	≤100	≤100	≤100
	Al	≤300	≤300	≤300
	Si	≤200	≤200	≤200
Zonyansa za gasi(ppm）	C	≤200	≤200	≤200
	N	≤100	≤100	≤100
	O	≤600	≤600	≤600
	S	≤75	≤75	≤75

Rich Special Equipment imagwira ntchito pa Manufacture of Sputtering Target ndipo imatha kupanga Iron Cobalt Tantalum Sputtering Materials malinga ndi zomwe Makasitomala afuna. Kuti mudziwe zambiri, chonde titumizireni.

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