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CuNiMn Sputtering Target High Purity Thin Film Pvd Coating Mwambo Wopangidwa

Copper Nickel Manganese

Kufotokozera Kwachidule:

Gulu

Aloyi Sputtering Target

Chemical Formula

CuNiMn

Kupanga

Copper Nickel Manganese

Chiyero

99.9%, 99.95%, 99.99%

Maonekedwe

Mbale, Zolinga za Column, arc cathodes, Zopangidwa mwamakonda

Njira Yopanga

Kusungunuka kwa Vacuum

Kukula komwe kulipo

L≤2000mm, W≤200mm


Tsatanetsatane wa Zamalonda

Zolemba Zamalonda

Copper Nickel Manganese sputtering chandamale amapangidwa pogwiritsa ntchito vacuum kusungunuka. Imakhala ndi chiyero chapamwamba komanso ma conductivity amagetsi ndipo imatha kugwiritsidwa ntchito pamakampani owonetsera.

Copper Nickel Manganese alloy nthawi zambiri amakhala ndi Nickel 2% ~44%, Manganese 0.1% ~ 28% ndi Copper balance. Manganese amawonetsa kusungunuka kolimba mumkuwa ndipo ndi njira yabwino yolimbikitsira njira. Ikhoza kusintha zinthu za alloy.

Rich Special Equipment imagwira ntchito pa Manufacture of Sputtering Target ndipo imatha kupanga Copper Nickel Manganese Sputtering Equipment malinga ndi zomwe makasitomala akufuna. Kuti mudziwe zambiri, chonde titumizireni.


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