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CuIn Sputtering Target High Purity Thin Film Pvd Coating Mwambo Wopangidwa

Copper Indium

Kufotokozera Kwachidule:

Gulu

Aloyi Sputtering Target

Chemical Formula

Kumene

Kupanga

Copper Indium

Chiyero

99.9%, 99.95%, 99.99%

Maonekedwe

Mbale, Zolinga za Column, arc cathodes, Zopangidwa mwamakonda

Njira Yopanga

Kusungunuka kwa Vacuum

Kukula komwe kulipo

L≤2000mm, W≤200mm


Tsatanetsatane wa Zamalonda

Zolemba Zamalonda

Copper Indium alloy sputtering target imapangidwa mwachizolowezi pogwiritsa ntchito vacuum induction kusungunuka. Indium imatha kupanga mitundu yosiyanasiyana ya aloyi a indium okhala ndi pafupifupi zinthu zonse patebulo la periodic. Copper Indium alloy ndi alloy binary, nthawi zambiri amagwiritsidwa ntchito ngati alloy low melting alloy ndi brazing alloy.

Copper Indium alloy sputtering target ili ndi mwayi wodziwika kuti imatha kupanga zokutira za PVD zokhala ndi magetsi abwino kwambiri komanso kukula kwake kwambewu. Zitha kuthandizira kupanga zigawo za CIGS, zokhala ndi mkuwa (Cu), gallium (Ga), indium (In) ndi selenium (Se) ndipo amatchulidwa ndi zigawo zawo. CIGS ili ndi kutembenuka kwakukulu kwa photovoltaic, kotero imatha kusinthika kuti igwiritsidwe ntchito ngati wosanjikiza woyamwa ma cell a solar.

Rich Special Equipment imagwira ntchito pa Manufacture of Sputtering Target ndipo imatha kupanga Copper Indium Sputtering Equipment malinga ndi zomwe Makasitomala afuna. Kuti mudziwe zambiri, chonde titumizireni.


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