Yogulitsa CrAl Aloyi Sputtering Target High Purity Thin Film PVD Coating Mwambo Wopanga Wopanga ndi Wopereka

Chromium Aluminium

CrAl Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made Featured Image

Kufotokozera Kwachidule:

Gulu	Aloyi Sputtering Target
Chemical Formula	CrAl
Kupanga	Chromium Aluminium
Chiyero	99.7%, 99.9%, 99.95%, 99.99%
Maonekedwe	Mbale, Zolinga za Column, arc cathodes, Zopangidwa mwamakonda
Njira Yopanga	Kusungunuka kwa Vuto, PM
Kukula komwe kulipo	L≤2000mm, W≤200mm

Titumizireni imelo

Tsatanetsatane wa Zamalonda

Zolemba Zamalonda

Kupanga kwa Chromium Aluminium Sputtering Target kumaphatikizapo izi:

1. Pogaya ufa ndi kusakaniza.

2. Hot isostatic kukanikiza mankhwala kupeza theka anamaliza mankhwala.

3. Kukonza chandamale cha chromium aluminium alloy sputtering chandamale kuti apeze chromium aluminium alloy sputtering chandamale.

Panthawi yoyika zolinga za CrAl sputtering, zokutira zolimba za Aluminium-Chrom-Nitrid (AlCrN) zimapangidwa. Chophimba ichi chikuwonetsa kuuma kwakukulu komanso kukana kwa okosijeni ngakhale kutentha kwambiri. Odula amatha kuthamanga pazakudya zambiri kuti awonjezere zokolola ndikukweza bwino akamagwiritsa ntchito makina a CNC.

Zolinga zathu za AlCr ndi katundu wawo

	Cr-70Alpa%	Cr-60Alpa%	Cr-50Alpa%
Chiyero (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
Kuchulukana(g/cm³）	3.7	4.35	4.55
Gmvula Kukula(µm)	100/50	100/50	100/50
Njira	HIP	HIP	HIP

Rich Special Equipment imagwira ntchito pa Manufacture of Sputtering Target ndipo imatha kupanga Aluminium Chromium Sputtering Materials molingana ndi makonda a Makasitomala. Zogulitsa zathu zimakhala ndi makina abwino kwambiri, mawonekedwe osakanikirana, opukutidwa popanda tsankho, pores kapena ming'alu. Kuti mudziwe zambiri, chonde titumizireni.

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