Takulandilani kumasamba athu!

CoFeV Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Cobalt Iron Vanadium

Kufotokozera Kwachidule:

Gulu

Aloyi Sputtering Target

Chemical Formula

Mtengo wa FeCoV

Kupanga

Cobalt Iron Vanadium

Chiyero

99.9%, 99.95%, 99.99%

Maonekedwe

Mbale, Zolinga za Column, arc cathodes, Zopangidwa mwamakonda

Njira Yopanga

Kusungunuka kwa Vacuum

Kukula komwe kulipo

L≤2000mm, W≤200mm


Tsatanetsatane wa Zamalonda

Zolemba Zamalonda

Cobalt Iron Vanadium sputtering target ili ndi 52% ya Cobalt, 9% -23% ya Vanadium ndi ena onse - ductile permanent-magnetic material. Imawonetsa kuthekera kwabwino kwambiri kwa pulasitiki ndipo imatha kupangidwa kukhala zigawo zovuta.

Cobalt Iron Vanadium alloy sputtering chandamale ali ndi kuchuluka kwachulukidwe kachulukidwe ka Bs (2.4T) ndi kutentha kwa Curie (980~1100 ℃). Ikhoza kuthandizira kuchepetsa kulemera kwa thupi komanso kumapangitsa kuti pakhale bata pamtunda wokwera. Ndizinthu zoyenera pazida zamagetsi zoyendera ndege (makina ang'onoang'ono apadera amagetsi, ma elekitiromagineti ndi ma relay amagetsi). Ilinso ndi machulukitsidwe apamwamba a magnetostriction coefficient, ndipo imatha kupanga transducer ya magnetostrictive.

Rich Special Equipment imagwira ntchito pa Manufacture of Sputtering Target ndipo imatha kupanga Cobalt Iron Vanadium Sputtering Materials malinga ndi zomwe Makasitomala afuna. Kuti mudziwe zambiri, chonde titumizireni.


  • Zam'mbuyo:
  • Ena: