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CoFeTaZr Alloy Sputtering Target High Purity Thin Film Pvd Coating Coating Mapangidwe

Cobalt Iron Tantalum Zirconium

Kufotokozera Kwachidule:

Gulu

Aloyi Sputtering Target

Chemical Formula

CoFeTaZr

Kupanga

Cobalt Iron Tantalum Zirconium

Chiyero

99.9%, 99.95%, 99.99%

Maonekedwe

Mbale, Zolinga za Column, arc cathodes, Zopangidwa mwamakonda

Njira Yopanga

Kusungunuka kwa Vacuum

Kukula komwe kulipo

L≤200mm, W≤200mm


Tsatanetsatane wa Zamalonda

Zolemba Zamalonda

Cobalt Iron Tantalum Zirconium sputtering chandamale amapangidwa ndi vacuum kusungunuka. Kapangidwe kameneka kamateteza bwino zigawo zikuluzikulu ku okosijeni ndikuwonetsetsa kuti ma microstructure ofanana, kukula kwa tirigu wofanana komanso kusasinthika kwakukulu kwa makanema osungidwa.

Pambuyo mankhwala kutentha, ndi PTF chandamale akhoza kwambiri bwino, choncho nthawi zambiri ntchito zofewa maginito wosanjikiza zakuthupi perpendicular maginito kujambula zigawo.

Rich Special Equipment imagwira ntchito pa Manufacture of Sputtering Target ndipo imatha kupanga Cobalt Iron Tantalum Zirconium Sputtering Materials molingana ndi Customer's specifications. Kuti mudziwe zambiri, chonde titumizireni.


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