Yogulitsa AlTa Sputtering Target High Purity Thin Film PVD zokutira Mwambo Wopanga Wopanga ndi Wopereka

Aluminium-Tantalum

AlTa Sputtering Target High Purity Thin Film PVD Coating Custom Made Featured Image

Kufotokozera Kwachidule:

Gulu	Aloyi Sputtering Target
Chemical Formula	AlTa
Kupanga	Aluminium-Tantalum
Chiyero	99.9%, 99.95%, 99.99%
Maonekedwe	Mbale, Zolinga za Column, arc cathodes, Zopangidwa mwamakonda
Njira Yopanga	Kusungunuka kwa Vuto, PM
Kukula komwe kulipo	L≤200mm, W≤200mm

Titumizireni imelo

Tsatanetsatane wa Zamalonda

Zolemba Zamalonda

Zolingazo zimakonzedwa pophatikiza Aluminiyamu ndi Tantalum ufa kapena kusungunuka kwa vacuum ndikutsatiridwa mpaka kukanika kwathunthu. Zinthu zophatikizikazi zimasinthidwa mwachisawawa ndipo zimapangidwa kukhala mawonekedwe omwe mukufuna.

Aluminium Tantalum sputtering chandamale ali ndi kuyera kwambiri, homogeneous microstructure komanso madutsidwe abwino kwambiri. Amagwiritsidwa ntchito kwambiri popanga mafilimu owonda kwambiri pamakampani owonetsa gulu lathyathyathya. Aluminiyamu Tantalum ikhoza kuwonjezeredwa kuti ipange mawonekedwe apamwamba a Titanium alloy kuti ipititse patsogolo kutentha kwake.

Zoyipa za Al-Ta alloy

kupanga	Zamkatimu(%）
	Ta	Fe	Si	C	O
AlTa60	55.0 ~ 65.0	≤0.05	≤0.02	≤0.01	≤0.05
AlTa70	65.0-75.0	≤0.05	≤0.02	≤0.01	≤0.05

Rich Special Equipment imagwira ntchito pa Manufacture of Sputtering Target ndipo imatha kupanga Aluminium Tantalum Sputtering Equipment malinga ndi zomwe Makasitomala afuna. Zogulitsa zathu zimakhala ndi makina abwino kwambiri, mawonekedwe osakanikirana, opukutidwa popanda tsankho, pores kapena ming'alu. Kuti mudziwe zambiri, chonde titumizireni.

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