NiTa Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Nickel Tantalum Sputtering Targets are manufactured by means of vacuum melting or powder metallurgical process. It has high purity and homogeneous microstructure.

Nickel Tantalum Sputtering Targets are extensively used in aerospace, aircraft, navigation industries. Its good resistance to high temperature surface reactivity derives from the considerable amount of Tantalum present in the alloy, which has a high melting temperature of 3000°C. Aluminum, Yttrium and Chronium are usually added in order to improve the properties.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Nickel Tantalum Sputtering Materials according to Customers’ specifications. For more information, please contact us.