NiCrCu Sputtering Target High Purity Thin Film Pvd Coating Custom Made

NiCrCu Sputtering target is produced by the Melting and Casting of raw materials of Nickel Chromium Copper. It has high resistivity, low temperature coefficient and high sensitivity. Nickel and Chromium have similar surface energy, and the composition of NiCrCu thin-film deposition is similar to the sputtering target, so it is easy to control the deposition result.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Nickel Chromium Copper Sputtering Materials according to Customers’ specifications. For more information, please contact us.