NiCrAlSi Sputtering Target High Purity Thin Film Pvd Coating Custom Made

NiCrAlSi Sputtering target is produced by Vacuum Melting, Casting and Hot Treatment to ensure the high consistency, fine grain size and good performance.

Owing to its excellent high resistivity, good anti-corrosion behavior, high temperature resistance and solderability, Nickel Chromium Aluminum Silicon alloy is extensively used in many industrial applications, including Metallurgy, Mechanical manufacturing, and Household Appliances.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Nickel Chromium Aluminum Silicon Sputtering Materials according to Customers’ specifications. For more information, please contact us.