Vacuum plating in the selection of sputtering target materials has been a issue for people, at present, as the sputtering coating, especially the development of the magnetron sputtering coating skills, can be said for any information to be able to target material preparation of thin films by ion bombardment, because by sputtering target material in the process of the coating to the kind of substrate, has an important effect on the quality of sputtering film,Therefore, the target material requirements are more stringent. Here we will learn about the role of sputtering target in vacuum coating together with The editor of Beijing Relaxation
一、Selection principle and classification of target material
In the selection of target material, in addition to the use of the film itself should be selected, the following problems should also be considered:
Problem 1. According to the use and performance requirements of the membrane, it is necessary for the target material to meet the technical requirements of purity, magazine content, component uniformity, machining accuracy and so on.
Problem 2. The target material should have good mechanical strength and chemical stability after film forming;
Problem 3. It is necessary for the film material to generate compound film easily with the reaction gas as the reactive sputtering film;
Problem 4. It is necessary to set the target and the matrix to be strong, otherwise, the film material with good adhesion with the matrix should be adopted, first sputter a layer of bottom film and then prepare the required film layer;
Question 5. On the premise of meeting the performance requirements of the film, the smaller the difference between the thermal expansion coefficient of the target and the matrix, the better, so as to reduce the influence of the thermal stress of the sputtering film;
Preparation of several commonly used targets
(1) cr target
Chromium as a sputtering film material is not only easy to combine with the base material has high adhesion, and chromium and oxide CrQ3 film, its mechanical properties, acid resistance and thermal stability are better.
Beijing Ruichi High-tech Co., Ltd. mainly engaged in: titanium target zirconium target, aluminum target, nickel target, chromium target, tungsten target, molybdenum target, copper target, silicon target, niobium target, tantalum target, titanium-silicon alloy target, titanium-niobium alloy target, titanium-tungsten alloy target, titanium-zirconium alloy target, nickel-chromium alloy target, silica-aluminum alloy target, nickel-vanadium alloy target, chromium-aluminum-silicon ternary alloy target，Ti al si ternary alloy target material, widely used in decoration/hard surface and functional coating, architectural glass, flat display/optical photoelectric, optical storage, electronics, printing and other professions.
Post time: Jun-02-2022