Sputtering titanium alloy target and titanium metal are composed of titanium, so the information is roughly the same, but the difference between the two mainly lies in the sputtering titanium alloy target is made of titanium metal through several ways, and titanium occurs in nature as a titanium ore.Titanium alloy targets can be widely used in many occupational categories,Now Beijing richmat’s author summarized several common titanium alloy target in terms of the use of the situation to give us a detailed introduction.
一、Ti targets for integrated circuits
The requirements for sputtering titanium alloy targets are different between non-integrated circuits and integrated circuits. In general, integrated circuits have higher requirements for coating data, such as higher purity, smaller grain size and more accurate scale accuracy.The purity of titanium targets in integrated circuits is greater than 99.995%, which is higher than that used in non-integrated circuits, indicating that different uses of titanium target requirements are very different.
二、Ti target for flat panel display
Titanium alloy targets used in flat panel displays include liquid crystal display, plasma display, electroluminescence display and field emission display.The thin film of flat display is sputtered forming method, Al, Cu, Ti and Mo are the primary metal sputtering targets for flat panel displays.Purity of titanium alloy targets for flat panel displays is usually greater than 99.9%.
三、Ti targets for decorative materials
High purity titanium alloy target material has excellent air corrosion resistance, long-term use in the air does not change color, to ensure the original color of titanium and human contact is not allergic and other excellent characteristics. Therefore, high purity titanium can also be used as decorative materials, in recent years, such as bracelets, watches and glasses and other ornaments with titanium purity has reached 5N level.
四、Ti targets for ultra-high vacuum pumping systems
As a chemically active metal, titanium can react with many elements and compounds at high temperature. The high purity titanium alloy target has a strong adsorption capacity for active gases (such as O2, N2, CO, CO2, water vapor above 650°C), and the Ti film evaporating on the pump wall can form a surface with high adsorption performance. This property makes Ti widely used as an getter in ultra-high vacuum gas extraction system.If used to improve the pump, sputtering ion pump, etc., it can make the ultimate operating pressure of sputtering ion pump as low as 10-9PA
Post time: Apr-25-2022