Titanium-aluminum alloy target is a material used in physical vapor deposition (PVD) technology. The TiAl alloy target is an alloy of two metals, titanium (Ti) and aluminum (Al), that is made into a specific shape (usually a disk or rectangular block) for depositing thin films in a vacuum environment by means of sputtering. Sputtering is a physical process in which the surface of a target is bombarded with high-energy particles (such as argon ions) in a high vacuum environment, so that the target atoms or molecules are sputtered out and then deposited on the base material to form a film.
The ratio of titanium to aluminum in titanium aluminum alloys can vary in many ways. Different ratios can lead to differences in the performance of the target. For example, when the titanium content is higher, the target may have better high temperature resistance and strength properties; When aluminum content is higher, it may be outstanding in some specific electrical or optical properties. Common titanium aluminum alloy composition ratio is Ti-50Al (atomic percentage), Ti-60Al and so on.
ITEM | Ti-75Alat% | Ti-70Alat% | Ti-67Alat% | Ti-60Alat% | Ti-50Alat% | Ti-30Al at% | Ti-20Alat% | Ti-16Alat% |
Purity | 99.7 | 99.7 | 99.7 | 99.7 | 99.8/99.9 | 99.9 | 99.9 | 99.9 |
Density(g/cm³) | 3.1 | 3.2 | 3.3 | 3.4 | 3.63/3.85 | 3.97 | 4.25 | 4.3 |
Grain size(um) | 100 | 100 | 100 | 100 | 100/- | - | - | - |
Process | HIP | HIP | HIP | HIP | HIP/VAR | VAR | VAR | VAR |
Post time: Dec-13-2024