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Titanium Aluminum (TiAl) alloy target

Titanium-aluminum alloy target is a material used in physical vapor deposition (PVD) technology.  The TiAl alloy target  is an alloy of two metals, titanium (Ti) and aluminum (Al), that is made into a specific shape (usually a disk or rectangular block) for depositing thin films in a vacuum environment by means of sputtering. Sputtering is a physical process in which the surface of a target is bombarded with high-energy particles (such as argon ions) in a high vacuum environment, so that the target atoms or molecules are sputtered out and then deposited on the base material to form a film.

The ratio of titanium to aluminum in titanium aluminum alloys can vary in many ways. Different ratios can lead to differences in the performance of the target. For example, when the titanium content is higher, the target may have better high temperature resistance and strength properties; When aluminum content is higher, it may be outstanding in some specific electrical or optical properties. Common titanium aluminum alloy composition ratio is Ti-50Al (atomic percentage), Ti-60Al and so on.

                                                      Typical TiAl targets and their properties
ITEM Ti-75Alat% Ti-70Alat% Ti-67Alat% Ti-60Alat% Ti-50Alat% Ti-30Al at% Ti-20Alat% Ti-16Alat%
Purity 99.7 99.7 99.7 99.7 99.8/99.9 99.9 99.9 99.9
Density(g/cm³) 3.1 3.2 3.3 3.4 3.63/3.85 3.97 4.25 4.3
Grain size(um) 100 100 100 100 100/- - - -
Process HIP HIP HIP HIP HIP/VAR VAR VAR VAR
Titanium aluminum targets are widely used in  the fileds of decoration and mold coating, the rarget react with nitrogen gas during the depostion process through arc, sputtering and ecaporation to generate TiAlN coating. This coating has good toughness and oxidation resistance.

Post time: Dec-13-2024