The wide use of target material in various professions makes the demand for target material higher and higher. The following We will briefly introduce you what is the primary functional requirements of the target, hoping to help you.
Purity: Purity is one of the primary functional indicators of the target, because the purity of the target has a great impact on the function of the film. But in practice, the purity of the target material is not the same. For example, with the rapid growth of the microelectronics profession,The size of silicon wafer has developed from 6 “, 8 “to 12″, and the wiring width has decreased from 0.5um to 0.25um,0.18um and even 0.13um. Once 99.995% of the target purity can meet the technological requirements of 0.35UMIC. The preparation of 0.18um line requires 99.999% or even 99.9999% purity of target material.
Density: In order to reduce the porosity in the target solid and improve the function of the sputtering film, the target is usually required to have a high density. The target density affects not only the sputtering rate but also the electrical and optical properties of the films. The higher the target density, the better the function of the film.In addition, the density and strength of the target material were increased to make it better able to withstand the thermal stress during sputtering. Density is also one of the important functional indicators of target substances.
Impurity content: impurities in the target solid and oxygen and water vapor in the pores are the primary pollution sources of the accumulated films.Different target materials for different purposes have different requirements for different impurity content. For example, pure aluminum and aluminum alloy targets used in the semiconductor industry have special requirements for alkali metal content and radioactive element content.
Post time: Jun-06-2022