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Application of refractory metals in thin photovoltaic films
Rich Special Materials Co.,Ltd. has many years of experience in the production of high performance materials, especially refractory metals such as rhenium, niobium, tantalum, tungsten and molybdenum. As one of the world’s largest manufact...Read more -
A closer look at thin film deposition technology
Thin films continue to attract the attention of researchers. This article presents current and more in-depth research on their applications, variable deposition methods, and future uses. “Film” is a relative term for a two-dimensi...Read more -
Nickel-niobium/nickel-niobium (NiNb) alloy
we supplies a full range of alloys, including nickel-niobium or nickel-niobium (NiNb) master alloys for the nickel industry. Nickel-Niobium or Nickel-Niobium (NiNb) alloys are used in the production of specialty steels, stainless steels and superalloys for ...Read more -
Distribution of EMI shielding materials: an alternative to sputtering
Protecting electronic systems from electromagnetic interference (EMI) has become a hot topic. Technological advances in 5G standards, wireless charging for mobile electronics, antenna integration into the chassis, and the introduction of System in Package (SiP) are dr...Read more -
Preparation technology and application of high-purity tungsten target
Due to the high temperature stability, high electron migration resistance and high electron emission coefficient of refractory tungsten and tungsten alloys, high-purity tungsten and tungsten alloy targets are mainly used for manufacturing gate electrodes, connection wiring, diffusion barrier ...Read more -
High entropy alloy sputtering target
High entropy alloy (HEA) is a new type of metal alloy developed in recent years. Its composition is composed of five or more metal elements. HEA is a subset of multi-primary metal alloys (MPEA), which are metal alloys containing two or more main elements. Like MPEA, HEA is famous for its supe...Read more -
Sputtering target – nickel chromium target
Target is the key basic material for the preparation of thin films. At present, the commonly used target preparation and processing methods mainly include powder metallurgy technology and traditional alloy smelting technology, while we adopt the more technical and relatively new vacuum smelti...Read more -
Ni-Cr-Al-Y sputtering target
As a new type of alloy material, nickel-chromium-aluminum-yttrium alloy has been widely used as a coating material on the surface of hot end parts such as aviation and aerospace, gas turbine blades of automobiles and ships, high pressure turbine shells, etc. due to its good heat resistance, c...Read more -
Introduction and application of Carbon（pyrolytic graphite）target
Graphite targets are divided into isostatic graphite and pyrolytic graphite. The editor of RSM will introduce pyrolytic graphite in detail. Pyrolytic graphite is a new type of carbon material. It is a pyrolytic carbon with high crystalline orientation which is deposited by chemical vapor on ...Read more -
Tungsten Carbide Sputtering Targets
Tungsten carbide (chemical formula: WC) is a chemical compound (precisely, a carbide) containing equal parts of tungsten and carbon atoms. In its most basic form, tungsten carbide is a fine gray powder, but it can be pressed and formed into shapes for use in industrial machinery, cutting tool...Read more -
Introduction and Application of Iron Sputtering Target
Recently, customer wanted to paint the product wine red. He asked technician from RSM about pure iron sputtering target. Now let’s share some knowledge about iron sputtering target with you. The iron sputtering target is a metal solid target composed of high purity iron metal. Iron...Read more -
Application of AZO Sputtering Target
AZO sputtering targets are also referred to as aluminum-doped zinc oxide sputtering targets. Aluminum-doped zinc oxide is a transparent conducting oxide. This oxide is insoluble in water but is thermally stable. AZO sputtering targets are typically used for thin-film deposition.So what kind o...Read more