Nickel Chromium Ni/Cr Sputtering Targets

Nickel chromium target materials have excellent antioxidant and corrosion resistance properties, adapt to a wide range of temperature changes, and are used to protect the film layer or workpiece surface. In the vacuum coating industry, NiCr alloy targets and thin films are widely used for surface protection films such as wear resistance, corrosion resistance, and heat resistance, as well as resistance films, involving different fields such as low radiation glass, microelectronics, magnetic recording, semiconductors, and thin film resistors.

                                   Specification of Nickel Chromium Targets

The company’s R&D team has conducted in-depth research on any proportion of NiCr alloy, and our product can provide Cr content from 5% to 80%, with multiple purities available, including 99.5%, 99.7%, 99.8%, 99.9%, 99.95%, 99.99%, etc. 

The production process of nickel-chromium alloy targets varies depending on the production method, and the following is a common production process:

Ingredients: According to the composition requirements of the target material, the high-purity nickel and chromium raw materials are mixed in a certain proportion.

 Smelting: The prepared raw material is put into the vacuum induction melting furnace for melting to obtain nickel-chromium alloy ingot. The melting process needs to control the temperature, pressure and other parameters to ensure the composition and quality of the alloy.

 Ingot casting: The smelted ingot of nickel-chromium alloy is cast to obtain the ingot of nickel-chromium alloy. In the casting process, parameters such as casting speed and cooling speed need to be controlled to ensure the quality of the ingot.

Processing: The nichrome alloy ingot is processed to obtain the Nichrome alloy target of the desired size and shape. It is necessary to control machining precision, surface quality and other parameters in the processing process to ensure the quality of the target.