High Purity Yttrium Target — An Important Member of PVD Coating

What is yttrium sputtering target?
     Yttrium target is mainly produced by the metal element yttrium sputtering target, because yttrium element (Y) is one of the rare earth metal elements, so yttrium target is also known as rare earth target.
     Yttrium targets are mainly used in sputtering deposition technology. Sputtering deposition technology is one of the physical vapor deposition (PVD) technologies, and is one of the main technologies for the preparation of electronic thin film materials. By bombarding the surface of the target with high-energy particles (such as ions or electron beams), the target atoms or molecules are sputtered out and deposited on another substrate to form the desired film or coating.
    The yttrium target is simply the source material of the desired film or coating prepared by the PVD technology.

What is the yttrium sputtering target used for?

Yttrium targets have a wide range of applications in several fields, the following are the main application areas:

1.  Semiconductor materials: In the semiconductor industry, yttrium targets are used to produce specific layers in semiconductor materials or electronic components, such as transistors, integrated circuits, etc.
2. Optical coating: In the field of optics, yttrium targets can be used to prepare optical coatings with high refractive index and low scattering rate, which play an important role in the production of optical devices such as lasers and optical filters.
3. Thin film deposition: The yttrium target occupies an important position in thin film deposition technology, and its high purity, good stability, and specific physical and chemical properties make it an ideal choice for preparing a variety of thin film materials. These thin film materials have a wide range of applications in optical, electronic, magnetic, and other fields.
4.  Medical field: yttrium targets have important applications in radiation medicine, such as a source of X-rays and gamma rays, diagnostic imaging (such as CT scans),and radiation therapy. In addition, specific isotopes of yttrium (such as Y-90) can also be used in radiopharmaceuticals for targeted treatment of specific cancers.
5. Nuclear energy industry: In nuclear reactors, yttrium targets are used as lever materials for controlling the speed and stability of nuclear reactions due to their excellent neutron absorption capacity.

Note: Since the performance requirements of yttrium targets in different application fields may be different, the appropriate target needs to be selected according to the actual situation in the specific application. (Such as specific purity, composition ratio, size, shape, etc., customized according to specific requirements.)

Production technology of yttrium sputtering targets? 

1. Prepare yttrium powder    2. HIP, pressing molding    3.  High- temperature sintering  4.Subsequent processing (Cutting, Polishing, etc.)    5. Cleaning and packing

 Note:Besides the above basic steps, according to the specific preparation method and application needs, yttrium sputtering targets may also involve other steps and technologies, such as the sputtering method, vacuum melting method, etc. These methods help to further adjust and optimize the performance and structure of the target material.

How to choose a high-quality sputtering target?

The following lists the 7 important factors for selecting high-quality sputtering targets:

 1.High purity

High-purity targets have better material properties and more stable physical and chemical properties, which is essential to ensure the quality and performance of sputtering coatings. Specific purity requirements should be determined according to the application scenario, some simple application scenarios do not need to pursue ultra-high purity, so as not to increase unnecessary costs. What suits you is the best.

2.Stability

The stability of the target is equally important, which can avoid material loss or performance fluctuations during sputtering. Therefore, in the selection, one choose that special treatment or have good stability of the product.

3.Size and shape

The size and shape of the sputtering target should be selected according to the specific requirements of the coating equipment to adapt to different sputtering processes and production needs. Ensuring that the target is matched to the equipment increases sputtering efficiency and reduces waste.

4.Density

Density is one of the important indicators to measure the quality of the target material. High-density target material can ensure better sputtering effect. When selecting, you should pay attention to the density data of the target, and try to choose products with higher density.

5.Processing accuracy

The processing accuracy of the target is also one of the factors that need to be considered. Generally, the processing accuracy of the target is required to be within ±0.1mm to ensure the stability of the sputtering process and the uniformity of the coating quality.

6.Special requirements

For some special application scenarios, such as the need for high light transmittance, low absorption of the target (optical coating) or high conductivity, high stability of the target (electronic field), should be selected according to the specific needs of the corresponding target type.

7.Select a professional manufacturer or supplier.