A sputtering target is an electronic material that forms a thin film by attaching a substance such as an alloy or a metal oxide to an electronic substrate at an atomic level. Among them, the sputtering target for the blackening film is used to form a film on the organic EL or liquid crystal panel to blacken the wiring and reduce the visible light reflectance (low reflectance) of the TFT wiring. The sputter target has the following advantages and effects. Compared with the previous products, it helps to improve the high degree of fineness and design freedom of various displays, and reduce the noise caused by the wiring reflected light of semiconductor related products.
Advantages and effects of aluminum target:
(1) After the aluminum target is formed on the wiring, the visible light can be reduced
compared with previous products, it can achieve low reflection.
(2) DC sputtering can be performed without reactive gas
compared with previous products, it is helpful to realize the film homogeneity of large substrates.
(3) After the film is formed, the etching process can be performed together with the wiring
adjust the material according to the existing etching process of the customer, and can etch together with the wiring without changing the existing process. In addition, the company will also provide support according to the sputtering conditions of customers.
(4) Excellent heat resistance, water and alkali resistance
in addition to water resistance and alkali resistance, it also has high heat resistance, so the characteristics of the film will not change in the TFT wiring processing process.
Post time: Aug-10-2022