Cobalt sputtering target is made of high purity cobalt. Co metal target with Excellent magnetic properties, such as high saturation magnetization. Cobalt sputtering target production process covers powder metallurgy or melting casting, which is made by multiple processes. Co target plays a significant role in the field of electronic information, and is used in hard disk magnetic recording layer and magnetic sensor.
What is the Characteristics of cobalt sputtering targets?
1.Cobalt is a silver-gray luster metal with a close-packed hexagonal crystal structure. Cobalt sputtering targets have a high density of about 8.9g/cm³, which allows for a relatively stable atomic flow during sputtering. At the same time, its melting point is high, reaching 1495℃, which gives the target good stability in the high temperature sputtering environment.
2.Cobalt has good chemical stability at room temperature, but chemical reactions may occur in specific environments such as high temperature, high humidity or strong acid and base. In the sputtering process, cobalt and some reaction gases (such as oxygen, nitrogen, etc.) can form compound films with special properties. For example, reacting with oxygen can produce oxide films of cobalt, which have certain magnetic and semiconductor properties
3.Cobalt is a ferromagnetic metal with a high saturation magnetization and Curie temperature (about 1131 ° C). This makes the cobalt sputtering target have unique advantages in the preparation of magnetic films. Magnetic films made of cobalt are widely used in electronics, communications, computers and other fields, such as magnetic recording layers of hard disk drives and magnetic sensors.
What is the production technology of cobalt sputtering targets:
I.Raw material preparation
- The production of cobalt sputtering targets first requires the selection of high-purity cobalt raw materials, and the purity of cobalt is generally required to be above 99.95%
- powder metallurgic method
II.Mixed powder
The pre-treated cobalt powder and a small amount of additives (such as lubricants, binders, etc.) are fully mixed in the mixing equipment according to a certain proportion. The function of the additive is to improve the pressing and sintering properties of the powder, and improve the density and uniformity of the target material.
suppress
The mixed powder is pressed into the desired shape and size by cold isostatic pressing or die pressing. In the pressing process, it is necessary to control the parameters such as pressure, pressing speed and holding time to ensure the density uniformity and strength of the billet. Generally speaking, the pressing pressure is between 200-500MPa.
III.sintering
The pressed billet is put into a vacuum sintering furnace or an atmosphere sintering furnace for sintering. The sintering temperature is usually between 1000-1300 ℃, and the sintering time depends on the size and shape of the billet, generally 2-10 hours. In the sintering process, the powder particles in the billet are gradually combined by diffusion, solid reaction and other mechanisms to form a dense target. In order to improve the performance of the target, sometimes advanced sintering processes such as hot isostatic pressing sintering are used.
IV.Mechanical processing is required after sintering to achieve the final dimensional accuracy and surface finish requirements. Machining includes cutting, turning, grinding, drilling and other processes. In the machining process, it is necessary to select the appropriate tool and machining parameters to reduce the damage to the target during the machining process
V.Quality control of cobalt sputtering targets
VI.check and packing
What is the application areas of cobalt sputtering targets ?
In terms of electronic information, Co target is an important material for magnetic recording layer of hard disk and magnetic sensor components to ensure data storage and sensing functions.
In the field of new energy, cobalt sputtering target is used to improve the performance of solar cell electrodes and lithium-ion battery diaphragms. In the field of optics, magneto-optical films can be prepared for optical communication and so on.
In mechanical engineering, Co pvd target can improve the wear resistance of tool and die coating. In the field of catalysis, it can be used as a carrier or active component to help chemical reactions.
In the field of electroplating, Cobalt thin film coaitng materials can enhance the surface quality and corrosion resistance of parts, which has irreplaceable significance in the process of multi-industry technology development.
Post time: Dec-21-2024