1. Magnetron sputtering method:
Magnetron sputtering can be divided into DC sputtering, medium frequency sputtering and RF sputtering
A. DC sputtering power supply is cheap and the density of deposited film is poor. Generally, domestic photothermal and thin-film batteries are used with low energy, and the sputtering target is conductive metal target.
B. The RF sputtering energy is high, and the sputtering target can be non-conductive target or conductive target.
C. Medium frequency sputtering target can be ceramic target or metal target.
2. Classification and application of sputtering targets
There are many kinds of sputtering targets, and the target classification methods are also different. According to the shape, they are divided into long target, square target and round target; According to the composition, it can be divided into metal target, alloy target and ceramic compound target; According to different application fields, it can be divided into semiconductor related ceramic targets, recording medium ceramic targets, display ceramic targets, etc. Sputtering targets are mainly used in electronic and information industries, such as information storage industry. In this industry, sputtering targets are used to prepare relevant thin film products (hard disk, magnetic head, optical disc, etc.). At present. With the continuous development of information industry, the demand for recording medium ceramic targets in the market is increasing. The research and production of recording medium targets has become the focus of extensive attention.
Post time: May-11-2022