Aluminum oxide target material, a material mainly composed of high-purity aluminum oxide (Al2O3), is used in various thin film preparation technologies, such as magnetron sputtering, electron beam evaporation, etc. Aluminum oxide, as a hard and chemically stable material, its target material can provide a stable sputtering source during the thin film preparation process, producing thin film materials with excellent physical and chemical properties. It is widely used in semiconductors, optoelectronics, decoration and protection, etc.
Its main application areas
Integrated Circuit Manufacturing Applications: Aluminum oxide targets are used in the manufacturing process of integrated circuits to form high-quality insulation and dielectric layers, improving the performance and reliability of circuits.
Application of Optoelectronic Devices: In optoelectronic devices such as LEDs and photovoltaic modules, aluminum oxide targets are used to prepare transparent conductive films and anti reflective layers, improving the photoelectric conversion efficiency of the devices.
Protective coating application: A thin film prepared from aluminum oxide targets is used on components in industries such as aviation and automotive to provide a wear-resistant and corrosion-resistant protective layer.
Decorative coating application: In the fields of furniture, building materials, etc., aluminum oxide film is used as a decorative coating to provide aesthetics while protecting the substrate from external environmental erosion.
Aerospace applications: In the aerospace field, aluminum oxide targets are used to prepare high-temperature and high-pressure resistant protective layers, protecting critical components from stable operation in special environments.
Post time: Jun-27-2024